Zobrazeno 1 - 6
of 6
pro vyhledávání: '"Wonkyun Yang"'
Publikováno v:
Transactions of the Korean Hydrogen and New Energy Society. 33:534-540
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::bca507f7cd1d87880bb48d8aca4aa72e
https://doi.org/10.7316/khnes.2022.33.5.534
https://doi.org/10.7316/khnes.2022.33.5.534
Autor:
Wonkyun Yang, Junghoon Joo
Publikováno v:
Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; Nov2009, Vol. 27 Issue 6, p1310-1315, 6p, 2 Black and White Photographs, 1 Diagram, 6 Graphs
Publikováno v:
Japanese Journal of Applied Physics. 52:085501
The discharge voltage–current characteristics and the optical diagnostics of a remote plasma sputtering system called by high density plasma assisted sputtering source (HiPASS) were investigated. The remote plasma was generated by the hollow cathod
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0ef62f0085e7128eed0647902f9667a2
https://doi.org/10.7567/jjap.52.085501
https://doi.org/10.7567/jjap.52.085501
Autor:
Yang, Wonkyun, Joo, Junghoon
Publikováno v:
Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; Jul2010, Vol. 28 Issue 4, p856-860, 5p, 2 Diagrams, 2 Charts, 5 Graphs
Autor:
Jung Hoon Joo, Won Kyun Yang
Publikováno v:
Journal of the Korean Physical Society. 54:971-975
March 2009 Special Issue on 17th World Interfinish Congress Heat Transfer Analysis in ICP-Assisted Bipolar Pulsed DC Magnetron Sputtering Wonkyun YANG and Junghoon JOO .........971 Etch Characteristics of TiO2 Etched by Using an Atomic Layer Etching
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7c302fae1aad7eb38d4ca053ec030b13
https://doi.org/10.3938/jkps.54.971
https://doi.org/10.3938/jkps.54.971
Publikováno v:
Japanese Journal of Applied Physics; Aug2013, Vol. 52 Issue 8R, p1-1, 1p