Correlation of alkali metal-induced work function changes on semiconductor and metal surfaces.

Autor: Heskett, D., Wong, T. Maeda, Smith, A. J., Graham, W. R., DiNardo, N. J., Plummer, E. W.

Publikováno v: Journal of Vacuum Science & Technology: Part B-Microelectronics Processing & Phenomena; 1989, Vol. 7 Issue 4, p915-918, 4p