Zobrazeno 1 - 10
of 30
pro vyhledávání: '"WonIl Cho"'
Autor:
Gyeong-Seo Park, Somin Lee, Min A Jeong, So Young Lee, Dong-Geun Cho, WonIl Cho, Seung-Chai Kim, Hwan-Ju Kim, Taek Geun Lee, Chang-Gi Jeong, Won-Il Kim, Yeonsu Oh, Ho-Seong Cho, Byoung-Joo Seo, Chonghan Kim
Publikováno v:
Pathogens, Vol 13, Iss 9, p 729 (2024)
Caseous lymphadenitis (CLA) is a chronic and subclinical bacterial disease of ruminants caused by Corynebacterium pseudotuberculosis (C. pseudotuberculosis) infection. Until 2014, there were no reports of CLA outbreaks in South Korea; however, the pr
Externí odkaz:
https://doaj.org/article/493dd466faf84ab7a0ee168267837592
Publikováno v:
Applied Sciences, Vol 11, Iss 11, p 4918 (2021)
Rapid development of electronic devices, ranging from personal communication devices to electric mobility solutions, has increased demand for energy storage devices not only in the production volume but also in the product functionality. Among many f
Externí odkaz:
https://doaj.org/article/2ffd0d7e540c436cac1ae390f819f2fe
Publikováno v:
Marine Genomics. 43:68-71
Climate change rapidly warms the ocean and marine species often move northwards for suitable habitats. Stony coral, Alveopora japonica, is observed more frequently for the last few years in temperate sea like Jeju Island, South Korea. To understand t
Publikováno v:
Journal of Climate Change Research. 9:1-12
Publikováno v:
Progress In Electromagnetics Research M. 73:37-46
Publikováno v:
ICCE
Impulse Response with 3D is a novel free-space pattern reconstruction technique which features deconvolution in azimuth and elevation domain to enhance quality of free-space pattern reconstruction compared with the previous technique, Impulse Respons
Autor:
Eric Kwon, Bill Kalsbeck, Paul Chung, Wonil Cho, Suein Son, Gregg Inderhees, Il-Yong Jang, Chan-Uk Jeon, Jiuk Hur, JeongHun Seo, Min Choo, Alexander Tan, In-Yong Kang
Publikováno v:
Photomask Technology 2018.
As the semiconductor industry advances to ever-smaller nodes with finer feature sizes and more complex mask designs, reticle quality and reticle defects continue to be a top mask yield risk. The primary reticle defect quality requirement is defined a
Publikováno v:
2018 IEEE International Symposium on Antennas and Propagation & USNC/URSI National Radio Science Meeting.
Numerical calculation of RCS at high frequency is quite challenging problem. In this correspondence, we apply the Cauchy method and the TLS theory to the RCS data at low frequency band and predict the RCS data at high frequency band. Using the error
Publikováno v:
International Conference on Extreme Ultraviolet Lithography 2017.
Classification and Printability of EUV Mask Defects from SEM images EUV lithography is starting to show more promise for patterning some critical layers at 5nm technology node and beyond. However, there still are many key technical obstacles to overc