Výsledky vyhledávání - "Won-nyoung Jeong"

Akademický článek

Development of the Tele-Measurement of Plasma Uniformity via Surface Wave Information (TUSI) Probe for Non-Invasive In-Situ Monitoring of Electron Density Uniformity in Plasma Display Fabrication Process

Autor: Si-Jun Kim, Min-Su Choi, Sang-Ho Lee, Won-Nyoung Jeong, Young-Seok Lee, In-Ho Seong, Chul-Hee Cho, Dae-Woong Kim, Shin-Jae You

Publikováno v: Sensors, Vol 23, Iss 5, p 2521 (2023)

The importance of monitoring the electron density uniformity of plasma has attracted significant attention in material processing, with the goal of improving production yield. This paper presents a non-invasive microwave probe for in-situ monitoring

Externí odkaz: https://doaj.org/article/529c4a8337e847e3ba60023453870fb4

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Akademický článek

Investigation into SiO2 Etching Characteristics Using Fluorocarbon Capacitively Coupled Plasmas: Etching with Radical/Ion Flux-Controlled

Autor: Won-nyoung Jeong, Young-seok Lee, Chul-hee Cho, In-ho Seong, Shin-jae You

Publikováno v: Nanomaterials, Vol 12, Iss 24, p 4457 (2022)

SiO2 etching characteristics were investigated in detail. Patterned SiO2 was etched using radio-frequency capacitively coupled plasma with pulse modulation in a mixture of argon and fluorocarbon gases. Through plasma diagnostic techniques, plasma par

Externí odkaz: https://doaj.org/article/2884197c289e476d8ad4d03186fff46e

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Akademický článek

Influence of Additive N2 on O2 Plasma Ashing Process in Inductively Coupled Plasma

Autor: Ye-Bin You, Young-Seok Lee, Si-Jun Kim, Chul-Hee Cho, In-Ho Seong, Won-Nyoung Jeong, Min-Su Choi, Shin-Jae You

Publikováno v: Nanomaterials, Vol 12, Iss 21, p 3798 (2022)

One of the cleaning processes in semiconductor fabrication is the ashing process using oxygen plasma, which has been normally used N2 gas as additive gas to increase the ashing rate, and it is known that the ashing rate is strongly related to the con

Externí odkaz: https://doaj.org/article/045575d698d647b4aec66124a4abaf1e

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Akademický článek

Development of a High-Linearity Voltage and Current Probe with a Floating Toroidal Coil: Principle, Demonstration, Design Optimization, and Evaluation

Autor: Si-jun Kim, In-ho Seong, Young-seok Lee, Chul-hee Cho, Won-nyoung Jeong, Ye-bin You, Jang-jae Lee, Shin-jae You

Publikováno v: Sensors, Vol 22, Iss 15, p 5871 (2022)

As the conventional voltage and current (VI) probes widely used in plasma diagnostics have separate voltage and current sensors, crosstalk between the sensors leads to degradation of measurement linearity, which is related to practical accuracy. Here

Externí odkaz: https://doaj.org/article/932ea57d62c34382adf6f1854152c408

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