Zobrazeno 1 - 10
of 11
pro vyhledávání: '"Wolfgang Zschocke"'
Autor:
Kai Schmidt, Wolfgang Zschocke, I. Klaft, Ludolf Herbst, Timur Misyuryaev, Igor Bragin, Andreas Targsdorf
Publikováno v:
SPIE Proceedings.
The paper presents a review of the most recent achievements in the development of the industrial high power excimer lasers. The results of the development of a XeCl laser with the output energy above 900mJ and the pulse repetition frequency up to 600
Autor:
Wolfgang Zschocke, Christian Reusch, Thomas Schmidt, Hans Stephan Albrecht, Rainer Paetzel, Peter Lokai, Stefan Spratte, Thomas Schroeder, Igor Bragin
Publikováno v:
SPIE Proceedings.
Excimer lasers are widely used as the light source for microlithography scanners. The volume shipment of scanner systems using 193nm is projected to begin in year 2003. Such tools will directly start with super high numerical aperture (NA) in order t
Autor:
Klaus Vogler, Wolfgang Zschocke, Farid Seddighi, Rainer Paetzel, Christian Reusch, Peter Lokai, Igor Bragin, Thomas Schroeder, Hans Stephen Albrecht, Anna Cortona, Kai Schmidt
Publikováno v:
SPIE Proceedings.
Capital costs and economical efficiency is becoming the most important criteria for any decision on lithography tools for an advanced IC fabrication facility. Each lithography wavelength has to compete for productivity, cost efficiency and return of
Autor:
Juergen Kleinschmidt, Rainer Paetzel, Wolfgang Zschocke, Klaus Vogler, Igor Bragin, Thomas Schroeder, Hans Stephen Albrecht
Publikováno v:
SPIE Proceedings.
High output power and ultra-narrow bandwidth has been the development goals for the 193 nm lithography excimer lasers in the last years to support the throughput and requirements of advanced 193 nm wafer scanner. Cost of ownership comparable to curre
Autor:
Uwe Stamm, Juergen Kleinschmidt, Rainer Paetzel, Thomas Schroeder, Igor Bragin, Peter Lokai, Wolfgang Zschocke, Martin Sprenger, Rustem Osmanov
Publikováno v:
SPIE Proceedings.
Results on the feasibility of highest repetition rate ArF lithography excimer lasers with narrow spectral bandwidth of less than 0.4 pm are presented. The current 193 nm lithography laser product NovaLine A2010 delivers output power of 10W at 2 kHz r
Autor:
Klaus Vogler, Rustem Osmanov, Uwe Stamm, Juergen Kleinschmidt, Thomas Schroeder, Dirk Basting, Wolfgang Zschocke, Vincent Berger, Igor Bragin, I. Klaft, Rainer Paetzel
Publikováno v:
SPIE Proceedings.
With the transition of DUV lithography into mass production, the economics of the excimer laser light sources is getting more important. The efforts in the development are directed towards an increase of the laser's repetition rate and output power f
Autor:
Juergen Kleinschmidt, Wolfgang Zschocke, Klaus Vogler, Dirk Basting, Igor Bragin, Uwe Stamm, Rainer Paetzel
Publikováno v:
SPIE Proceedings.
Considerable progress has been made in the development of the major components for 193 nm lithography tools. Here we describe the parameters of a line-narrowed ArF excimer laser for microlithography. With a specified FWHM bandwidth of less than 0.7 p
Autor:
Peter Genter, Dirk Basting, Wolfgang Zschocke, A. Wiebner, Uwe Stamm, Sergei V. Govorkov, Thomas Schroeder
Publikováno v:
SPIE Proceedings.
We report on the generation and potential applications of an UV light source tunable from 280 nm to 315 nm with an average power of more than 0.5 W and high absolute conversion efficiency. Overall conversion from the diode pumped Nd:YAG laser fundame
Publikováno v:
SPIE Proceedings.
A diode-pumped laser system is described operating at up to 1 kHz pulse repetition frequency. The system can be used at the wavelengths 1064 nm, 532 nm, 355 nm or 266 nm. Up to 10 W at 1064 nm and up to 6 W at 532 nm are generated. More than 4 W of a
Autor:
Uwe Guenzel, Jiri Kubelka, Michael P. Koselja, Mario Ledig, Wolfgang Zschocke, Uwe Stamm, Ernst Heumann, Jiri Kvapil
Publikováno v:
SPIE Proceedings.
We report on measurements of transient and steady-state pulse characteristics of an acousto- optically mode-locked titanium-doped sapphire laser. During the pulse evolution, oscillations in the pulse width and pulse energy are found. A steady state i