Zobrazeno 1 - 10 of 54 pro vyhledávání: '"Wolfgang Harnisch"'
5
Closing the infrastructure gap: status of the AIMS EUV project
Autor: Michael Goldstein, Markus Weiss, Sascha Perlitz, Dirk Hellweg, Wolfgang Harnisch, Jan Hendrik Peters
Publikováno v: SPIE Proceedings.
The EUV mask infrastructure is of key importance for a successful introduction of EUV lithography into volume production. In particular, for the production of defect free masks an actinic review of potential defect sites is required. With such a revi
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::3ce06208ef9f9e4473ce4cc2dbcad0e8
https://doi.org/10.1117/12.918691
Zobrazit plný text záznamu
6
Development status and infrastructure progress update of aerial imaging measurements on EUV masks
Autor: Dirk Hellweg, Ulrich Dr. Strößner, Jan Hendrik Peters, Sascha Perlitz, Markus Weiss, Wolfgang Harnisch
Publikováno v: SPIE Proceedings.
The high volume device manufacturing infrastructure for the 22nm node and below based on EUVL technology requires defect-free EUV mask manufacturing as one of its foundations. The EUV Mask Infrastructure program (EMI) initiated by SEMATECH has identi
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::4c2f9fe6738483824f6dd46fc02e8fbd
https://doi.org/10.1117/12.899038
Zobrazit plný text záznamu
7
Concept and feasibility of aerial imaging measurements on EUV masks
Autor: Dirk Hellweg, Michael Ringel, Ulrich Dr. Strößner, Sascha Perlitz, Wolfgang Harnisch, Heiko Feldmann
Publikováno v: 27th European Mask and Lithography Conference.
On the road to and beyond the 22nm half-pitch on chip patterning technology, 13.5nm EUVL is widely considered the best next technology generation following deep ultraviolet lithography. The availability of an actinic measurement system for the printa
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::2d5ddaf630a1dc18685f8072a84e0217
https://doi.org/10.1117/12.895208
Zobrazit plný text záznamu
8
Actinic review of EUV masks
Autor: Heiko Feldmann, Winfried Kaiser, Wolfgang Harnisch, Johannes Ruoff
Publikováno v: SPIE Proceedings.
Management of mask defects is a major challenge for the introduction of EUV for HVM production. Once a defect has been detected, its printing impact needs to be predicted. Potentially the defect requires some repair, the success of which needs to be
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::81dbc41997faf58fe5e415457ae44878
https://doi.org/10.1117/12.848380
Zobrazit plný text záznamu
10
Printability study with polarization based AIMS fab 193i to investigate mask polarization effects
Autor: Ulrich Stroessner, Rainer Schmid, Norbert Rosenkranz, Axel Zibold, Wolfgang Harnisch, Thomas Scherübl, Eric Poortinga
Publikováno v: 22nd European Mask and Lithography Conference.
Immersion lithography offers the semiconductor industry the chance to extend the current ArF processes to smaller nodes before switching to a shorter wavelength. The move to immersion will require increased attention to the photomask along with new e
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::0ae60d537a21316332c71b5de27b644f
https://doi.org/10.1117/12.692728
Zobrazit plný text záznamu

Vyhledávací nástroje:

Upřesnit hledání

Omezení vyhledávání
Plný text Recenzováno Digitální knihovna AV ČR
Zdroje