Zobrazeno 1 - 10
of 47
pro vyhledávání: '"Wim Fyen"'
Publikováno v:
Particles on Surfaces: Detection, Adhesion and Removal, Volume 7 ISBN: 9780429070716
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a9a37be8427cb1bd3beb15fa954d9a98
https://doi.org/10.1201/9780429070716-29
https://doi.org/10.1201/9780429070716-29
Autor:
Gert De Cremer, Bjorn Dieu, Wim Fyen, Sven Leyre, Bert F. Sels, Peter Hanselaer, Johan Hofkens, Eduardo Coutino-Gonzalez, Maarten B. J. Roeffaers
Publikováno v:
The Journal of Physical Chemistry C. 117:6998-7004
We have measured for the first time the external quantum efficiency (EQE) of silver clusters containing zeolites (henceforth referred to as silver-clusters zeolite composites). These materials, fabricated by silver cation exchange followed by a therm
Autor:
Sophia Arnauts, Sachin Attavar, Twan Bearda, Stephen P. Beaudoin, Jeffery W. Butterbaugh, Philip G. Clark, David A. Cole, Geert Doumen, John B. Durkee, Michael L. Free, Taketoshi Fujimoto, Wim Fyen, Anthony S. Geller, Kuniaki Gotoh, Aaron Harrison, Frank Holsteyns, Darby Hoss, Koji Kato, Karine Kenis, Rajiv Kohli, Jean L. Lee, Larry Levit, Chao-Hsin Lin, Wayne T. McDermott, Paul W. Mertens, Kashmiri L. Mittal, Tatsuo Nonaka, Othmar Preining, David J. Quesnel, Daniel J. Rader, Donald S. Rimai, David M. Schaefer, Robert Sherman, Arnold Steinman, Melissa Sweat, Kikuo Takeda, Myles Thomas, Joerg C. Tiller, Jan Van Steenbergen, Thomas J. Wagener, Zhong Lin Wang, Darren L. Williams, Lei Zhang, Chao Zhu
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::37b1f3628216a19f1764f5dc9d55fb0b
https://doi.org/10.1016/b978-0-323-29960-2.09996-2
https://doi.org/10.1016/b978-0-323-29960-2.09996-2
Autor:
Wim Fyen, Paul W. Mertens
Publikováno v:
IEEE Transactions on Semiconductor Manufacturing. 21:661-667
In this paper, a simple model is presented, describing an immersion rinsing process for flat solid substrates (e.g., semiconductor wafers). It is assumed that together with the solid a layer of processing liquid is transferred into a tank filled with
Publikováno v:
Solid State Phenomena. 134:173-176
Autor:
Kenichi Sano, James Snow, T. Veltens, Guy Vereecke, Atsuro Eitoku, Geert Doumen, Paul Mertens, Kurt Wostyn, Wim Fyen
Publikováno v:
Solid State Phenomena. 134:193-196
Cleaning of nano-particles is becoming a major challenge in semiconductor manufacturing as efficient particle removal must be achieved without substrate loss and without damage to fragile structures. In this work cleaning performance and structural d
Publikováno v:
Solid State Phenomena. 134:165-168
Autor:
S. O'Brien, Michael Benndorf, Kurt G. Ronse, Nickolay Stepanenko, D. Van den Heuvel, Roel Gronheid, Michael Kocsis, Wim Fyen, M. Meanhoudt, Shinji Kishimura, H-W Kim, Diziana Vangoidsenhoven, Kathleen Nafus
Publikováno v:
Journal of Photopolymer Science and Technology. 19:585-591
The immersion-specific watermark defect is discussed in its formation mechanism and in the influence of materials and exposure process. The non-topcoat approach was the basis of the work, where the properties of resist surface itself played the key r
Autor:
Jan Van Steenbergen, Frank Holsteyns, Sophia Arnauts, Wim Fyen, Paul Mertens, Geert Doumen, Guy Vereecke
Publikováno v:
Solid State Phenomena. :75-78
In this paper, a single wafer linear IPA vapour based vertical drying technique is presented. Using salt residue tests the performance of this technique is evaluated and compared to spin drying. The equivalent film thickness of evaporating liquid is
Autor:
Kai Dong Xu, Wim Fyen, Rita Vos, Geert Doumen, Guy Vereecke, Marc Heyns, Paul Mertens, Chris Vinckier, Jan Fransaer
Publikováno v:
Solid State Phenomena. :279-282
This study focuses on the analysis of the forces and moments acting on a particle to reveal the particle-removal mechanisms during a scrubbing process. The brush-asperities/substrate contact geometry during scrubbing is first investigated. The forces