Zobrazeno 1 - 6
of 6
pro vyhledávání: '"Wim Bouman"'
Autor:
Wim Bouman, Francis Fahrni, Wim de Boeij, Wolfgang Emer, Bernd Thüring, Thilo Pollak, Friso Klinkhamer
Publikováno v:
Optical Microlithography XXXIII.
Even with the large-scale adaption of EUV Lithography to High Volume Manufacturing, numerous device-critical product layers will still be exposed with Immersion Lithography Technology and therefore ZEISS and ASML keep investing in the next generation
Autor:
Wim de Boeij, Bart van Bussel, Young Ha Kim, Wim Bouman, Young Seog Kang, Roelof de Graaf, Jong Hoon Jang, AJ Arij Rijke, Chansam Chang, Richard Droste, Patrick Neefs, Jeong-Heung Kong, ByeongSoo Lee, Stefan Weichselbaum
Publikováno v:
SPIE Proceedings.
Adjustment and control of the illumination pupil asymmetry is relevant for wafer alignment and overlay of lithography tools. Pupil asymmetries can cause a tilt in aerial image (Aerial Image Tilt, or AIT). This AIT, combined with a focus offset, leads
Publikováno v:
Journal of Management Information Systems, 14(1), 93-118. M.E. Sharpe Inc.
PrimaVera Working Paper, 97-04
PrimaVera Working Paper, 97-04
This study addresses the complex relationship between fit and organizational performance in business reengineering. First, a framework for analysis based on the concept of fit is proposed. Three generic archetypes for three levels of ambitions are de
Autor:
Joost Bekaert, Dirk Jürgens, Gert Streutker, Wilfred Endendijk, J. Verbeeck, Robert John Socha, Andre Engelen, Bert van Drieenhuizen, Daniel Corliss, Melchior Mulder, Anita Bouma, Cas Johannes Petrus Maria Van Nuenen, Greg McIntyre, Bastian Trauter, Oscar Noordman, Joerg Zimmermann, Robert Kazinczi, Bart Laenens, Wim Bouman
Publikováno v:
SPIE Proceedings.
This paper describes the principle and performance of FlexRay, a fully programmable illuminator for high NA immersion systems. Sources can be generated on demand, by manipulating an array of mirrors instead of the traditional way of inserting optical
Publikováno v:
International Journal of Knowledge and Learning. 3:501
Lately, Web2.0 or social software receives a lot of attention, both by practitioners and academics, because of its ability to support social learning processes. We explore two criticisms that assess the learning impediments within current manifestati