Zobrazeno 1 - 10
of 93
pro vyhledávání: '"Wilman Tsai"'
Autor:
Fen Xue, Shy-Jay Lin, Mingyuan Song, William Hwang, Christoph Klewe, Chien-Min Lee, Emrah Turgut, Padraic Shafer, Arturas Vailionis, Yen-Lin Huang, Wilman Tsai, Xinyu Bao, Shan X. Wang
Publikováno v:
Nature Communications, Vol 14, Iss 1, Pp 1-9 (2023)
Abstract Electrical manipulation of magnetization without an external magnetic field is critical for the development of advanced non-volatile magnetic-memory technology that can achieve high memory density and low energy consumption. Several recent s
Externí odkaz:
https://doaj.org/article/48aff6bc59c3467985f35fc89665a5de
Autor:
Balreen Saini, Fei Huang, Yoon‐Young Choi, Zhouchangwan Yu, Vivek Thampy, John D. Baniecki, Wilman Tsai, Paul C. McIntyre
Publikováno v:
Advanced Electronic Materials, Vol 9, Iss 6, Pp n/a-n/a (2023)
Abstract As an emerging nonvolatile memory technology, HfO2‐based ferroelectrics exhibit excellent compatibility with silicon CMOS process flows; however, the reliability of polarization switching in these materials remains a major challenge. Durin
Externí odkaz:
https://doaj.org/article/86bcfa2c619a4f18911bb032576450e2
Autor:
Xiang Li, Shy-Jay Lin, Mahendra Dc, Yu-Ching Liao, Chengyang Yao, Azad Naeemi, Wilman Tsai, Shan X. Wang
Publikováno v:
IEEE Journal of the Electron Devices Society, Vol 8, Pp 674-680 (2020)
As spin-orbit-torque magnetic random-access memory (SOT-MRAM) is gathering great interest as the next-generation low-power and high-speed on-chip cache memory applications, it is critical to analyze the magnetic tunnel junction (MTJ) properties neede
Externí odkaz:
https://doaj.org/article/b33005b56c8b478d842c17dbd013fc64
Publikováno v:
APL Materials, Vol 9, Iss 10, Pp 101106-101106-8 (2021)
Spin–orbit torque (SOT) magnetoresistive random-access memory (MRAM) devices have been proposed for energy efficient memory and computing applications. New classes of materials such as antiferromagnets, topological insulators, and semimetals can ge
Externí odkaz:
https://doaj.org/article/0480b08078054e2c934a84a7b27fc743
Autor:
Lingming Yang, Adam Charnas, Gang Qiu, Yu-Ming Lin, Chun-Chieh Lu, Wilman Tsai, Qing Paduano, Michael Snure, Peide D. Ye
Publikováno v:
ACS Omega, Vol 2, Iss 8, Pp 4173-4179 (2017)
Externí odkaz:
https://doaj.org/article/66bcb037515f445dac7de22562482f14
Autor:
Mahendra DC, Ding-Fu Shao, Vincent D.-H. Hou, Arturas Vailionis, P. Quarterman, Ali Habiboglu, M. B. Venuti, Fen Xue, Yen-Lin Huang, Chien-Min Lee, Masashi Miura, Brian Kirby, Chong Bi, Xiang Li, Yong Deng, Shy-Jay Lin, Wilman Tsai, Serena Eley, Wei-Gang Wang, Julie A. Borchers, Evgeny Y. Tsymbal, Shan X. Wang
Publikováno v:
Nature Materials. 22:591-598
Autor:
William Hwang, Fen Xue, Fan Zhang, Ming-Yuan Song, Chien-Min Lee, Emrah Turgut, T. C. Chen, Xinyu Bao, Wilman Tsai, Deliang Fan, Shan X. Wang
Publikováno v:
IEEE Transactions on Magnetics. 59:1-6
Autor:
Zhouchangwan Yu, Balreen Saini, Yunzhi Liu, Fei Huang, Apurva Mehta, John D. Baniecki, H.-S. Philip Wong, Wilman Tsai, Paul C. McIntyre
Publikováno v:
ACS Applied Materials & Interfaces. 14:53057-53064
Hafnia-based ferroelectric thin films are promising for semiconductor memory and neuromorphic computing applications. Amorphous, as-deposited, thin-film binary alloys of HfO
Autor:
Balreen Saini, Fei Huang, Yoon‐Young Choi, Zhouchangwan Yu, Vivek Thampy, John D. Baniecki, Wilman Tsai, Paul C. McIntyre
Publikováno v:
Advanced Electronic Materials.
Autor:
Yandong Luo, Piyush Kumar, Yu-Ching Liao, William Hwang, Fen Xue, Wilman Tsai, Shan X. Wang, Azad Naeemi, Shimeng Yu
Publikováno v:
2022 IEEE International Memory Workshop (IMW).