Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Willy van Buel"'
Autor:
Henk-Jan H. Smilde, J. Ducote, Florent Dettoni, Yoann Blancquaert, Lars H. D. Driessen, Jerome Depre, Willy van Buel, Christophe Dezauzier, Jan Beltman, Richard Johannes Franciscus Van Haren
Publikováno v:
SPIE Proceedings.
Scatterometry mark design for improvement of the metrology performance is investigated in this joint work by ASML and STMicroelectronics. The studied marks are small, enabling metrology within the device area. The new mark-design approach reduces the
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::07964e37cae02b425339175b8742ba1a
https://doi.org/10.1117/12.2085642
https://doi.org/10.1117/12.2085642
Publikováno v:
SPIE Proceedings.
The increased demand for high throughput lithography with Front To Back-side Alignment (FTBA) capability has led ASML to develop the FTBA functionality within its current platform. This option is named 3DAlign and aims at an FTBA overlay of 500 nm. T
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f87c475ad2978367153e74b2902a8b56
https://doi.org/10.1117/12.487585
https://doi.org/10.1117/12.487585
Publikováno v:
Emerging Lithographic Technologies VI.
A novel front-to-back alignment method, which does not require additional alignment sensors, is being developed for optical projection lithography tools. The system is designed such that it can be easily retrofitted to existing systems. By embedding
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4118ff10f545a2812699dbe0efc1726a
https://doi.org/10.1117/12.472359
https://doi.org/10.1117/12.472359