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pro vyhledávání: '"William Trevillyan"'
Autor:
Richard G. Closser, William Trevillyan, Tzu-Ling Liu, Stacey F. Bent, Dara Bobb-Semple, Xiaoyun Yu, Il Kwon Oh
Publikováno v:
Chemistry of Materials. 33:902-909
Area-selective deposition (ASD) of low-k materials is desired in back-end-of-line processes for fabricating nanopatterns such as fully self-aligned vias. However, the high temperature and/or aggres...
Publikováno v:
Journal of Nanomaterials, Vol 2019 (2019)
VO2 particles are promising materials for thermochromic smart windows that reduce building energy loss. Continuous-flow hydrothermal processes showcase advantages for synthesizing VO2 particles compared with traditional batch reaction systems. Mixers