Výsledky vyhledávání - "William D. Hinsberg"

Contribution of EUV resist counting statistics to stochastic printing failures

Autor: Nimrod Megiddo, William D. Hinsberg, Martha I. Sanchez, Oleg Kostko, Gregory M. Wallraff

Publikováno v: Journal of Micro/Nanopatterning, Materials, and Metrology. 20

Background: Stochastic printing failures, manifested as random defects in a patterned photoresist image, result from statistical fluctuations in photon flux and resist components and are a key issue confronting extreme ultraviolet (EUV) lithography.

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::0f73f5e03fb8e2ddae6ce08ae118bc8b
https://doi.org/10.1117/1.jmm.20.1.014603

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An analysis of EUV resist stochastic printing failures

Autor: Nimrod Megiddo, Gregory M. Wallraff, Martha I. Sanchez, William D. Hinsberg

Publikováno v: International Conference on Extreme Ultraviolet Lithography 2019.

A simple physicochemical description of stochastic printing failures is discussed. By combining this with combinatorial calculations of resist imaging chemistry and Monte Carlo analysis, estimates of the rates of random printing failures in nanoscale

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::ad2d986218b07303cb1f4d795ef1cd0b
https://doi.org/10.1117/12.2537632

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Fundamental understanding of chemical processes in extreme ultraviolet resist materials

Autor: Bo Xu, Oleg Kostko, Paul D. Ashby, Kristina D. Closser, Yi Liu, David Prendergast, Gregory M. Wallraff, William D. Hinsberg, Patrick P. Naulleau, Deirdre L. Olynick, D. Frank Ogletree, Daniel Slaughter, Musahid Ahmed

Publikováno v: The Journal of chemical physics, vol 149, iss 15
Kostko, O; Xu, B; Ahmed, M; Slaughter, DS; Ogletree, DF; Closser, KD; et al.(2018). Fundamental understanding of chemical processes in extreme ultraviolet resist materials. The Journal of chemical physics, 149(15), 154305. doi: 10.1063/1.5046521. Lawrence Berkeley National Laboratory: Retrieved from: http://www.escholarship.org/uc/item/50h4g627

New photoresists are needed to advance extreme ultraviolet (EUV) lithography. The tailored design of efficient photoresists is enabled by a fundamental understanding of EUV induced chemistry. Processes that occur in the resist film after absorption o

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::0fdd58fc45c42e90990ab6ff04573ab5
https://escholarship.org/uc/item/50h4g627

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Stochastic methods for aerosol chemistry: a compact molecular description of functionalization and fragmentation in the heterogeneous oxidation of squalane aerosol by OH radicals

Autor: Aaron A. Wiegel, Frances A. Houle, William D. Hinsberg, Kevin R. Wilson

Publikováno v: Wiegel, AA; Wilson, KR; Hinsberg, WD; & Houle, FA. (2015). Stochastic methods for aerosol chemistry: A compact molecular description of functionalization and fragmentation in the heterogeneous oxidation of squalane aerosol by OH radicals. Physical Chemistry Chemical Physics, 17(6), 4398-4411. doi: 10.1039/c4cp04927f. Lawrence Berkeley National Laboratory: Retrieved from: http://www.escholarship.org/uc/item/120800qc
Physical chemistry chemical physics : PCCP, vol 17, iss 6

© the Owner Societies 2015. The heterogeneous oxidation of organic aerosol by hydroxyl radicals (OH) can proceed through two general pathways: functionalization, in which oxygen functional groups are added to the carbon skeleton, and fragmentation,

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::237e47c22a98fefd5902db43e0b95265
https://doi.org/10.1039/c4cp04927f

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Diffusive confinement of free radical intermediates in the OH radical oxidation of semisolid aerosols

Autor: Frances A. Houle, Matthew J. Liu, Kevin R. Wilson, Aaron A. Wiegel, William D. Hinsberg

Publikováno v: Wiegel, AA; Liu, MJ; Hinsberg, WD; Wilson, KR; & Houle, FA. (2017). Diffusive confinement of free radical intermediates in the OH radical oxidation of semisolid aerosols. Physical Chemistry Chemical Physics, 19(9), 6814-6830. doi: 10.1039/c7cp00696a. Lawrence Berkeley National Laboratory: Retrieved from: http://www.escholarship.org/uc/item/6k79g3t2
Physical chemistry chemical physics : PCCP, vol 19, iss 9

© 2017 the Owner Societies. Multiphase chemical reactions (gas + solid/liquid) involve a complex interplay between bulk and interface chemistry, diffusion, evaporation, and condensation. Reactions of atmospheric aerosols are an important example of

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::d6c6a609bab2117e576e4d3659bd65e6
https://pubmed.ncbi.nlm.nih.gov/28218326

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Simple and Versatile Methods To Integrate Directed Self-Assembly with Optical Lithography Using a Polarity-Switched Photoresist

Autor: William D. Hinsberg, Steven J. Holmes, Alexander Friz, Hoa D. Truong, Daniel P. Sanders, Joy Cheng, Stefan Harrer, Matthew E. Colburn

Publikováno v: ACS Nano. 4:4815-4823

We report novel strategies to integrate block copolymer self-assembly with 193 nm water immersion lithography. These strategies employ commercially available positive tone chemically amplified photoresists to spatially encode directing information in

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::b5e74b00e457d9a31031fe9426e8d963
https://doi.org/10.1021/nn100686v

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Integration of Directed Self-Assembly with 193 nm Lithography

Autor: Hoa Trung, Steven Harrer, Charles T. Rettner, Matthew E. Colburn, Steven J. Holmes, Ho-Cheol Kim, Daniel P. Sanders, Joy Cheng, William D. Hinsberg, Alexander Fritz

Publikováno v: Journal of Photopolymer Science and Technology. 23:11-18

Directed self-assembly (DSA), which combines self-assembled polymers with lithographically defined substrates, has been considered as a potential candidate to extend optical lithography. In order to assess the capabilities and limitations of DSA as a

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::01928b1b7435815e263268f415ac1d5d
https://doi.org/10.2494/photopolymer.23.11

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Directed Self-assembly on Sparse Chemical Patterns for Lithographic Applications

Autor: Young-Hye Na, Alshakim Nelson, Alexander Sutherland, Charles T. Rettner, Ho-Cheol Kim, Jed W. Pitera, Joy Cheng, William D. Hinsberg, Daniel P. Sanders

Publikováno v: Journal of Photopolymer Science and Technology. 22:219-222

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::f0e1530c5733a8bafce221a8a8444495
https://doi.org/10.2494/photopolymer.22.219

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Surface patterns from block copolymer self-assembly

Autor: William D. Hinsberg, Ho-Cheol Kim

Publikováno v: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 26:1369-1382

It is widely recognized that further extension of optical lithography to even smaller dimensions will be accompanied by rapid increasing cost and difficulty. There is growing interest in devising alternative patterning methods that will support the e

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::012a0642111fb782699f55f6ddd7ee59
https://doi.org/10.1116/1.3000056

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