Zobrazeno 1 - 10
of 12
pro vyhledávání: '"William C. Replogle"'
Autor:
Karen L. Jefferson, William C. Replogle, David Attwood, Donald W. Sweeney, Layton C. Hale, Donna J. O'Connell, Leonard E. Klebanoff, Alvin H. Leung, John B. Wronosky, Henry N. Chapman, Daniel A. Tichenor, Patrick P. Naulleau, Sang H. Lee, Glenn D. Kubiak, Kenneth A. Goldberg, James A. Folta, John S. Taylor, W. P. Ballard, Richard H. Stulen, John E. M. Goldsmith
Publikováno v:
Journal of Photopolymer Science and Technology. 15:351-360
The EUV Engineering Test Stand (ETS) has demonstrated the printing of static and scanned 100nm dense features. This milestone was first achieved in 2001 with a developmental set of projection optics (P0 Box 1) and with a low power LPP source (40W dri
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ba47eb97d48391b875d33b506bf66d72
https://doi.org/10.2494/photopolymer.15.351
https://doi.org/10.2494/photopolymer.15.351
Autor:
Pamela K. Barr, John E. M. Goldsmith, Henry N. Chapman, Eric M. Panning, Sang Hun Lee, Louis J. Bernardez, William C. Replogle, Patrick P. Naulleau, Daniel A. Tichenor, W. P. Ballard, Stefan Wurm, Donna J. O'Connell, Karen L. Jefferson, Steven J. Haney, Terry A. Johnson, Alvin H. Leung
Publikováno v:
SPIE Proceedings.
Static and scanned images of 100nm dense features for a developmental set of l/14 optics (projection optics box # 1, POB 1) in the Engineering Test Stand (ETS) were successfully obtained with various LPP source powers last year. The ETS with POB1 has
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ec1351a2eae2c26b522da8c94dc27619
https://doi.org/10.1117/12.484967
https://doi.org/10.1117/12.484967
Autor:
Karen L. Jefferson, Richard J. Anderson, Mark D. Zimmerman, Philip A. Grunow, J. Taylor, Patrick P. Naulleau, Alvin H. Leung, Pamela K. Barr, Richard H. Campiotti, E. M. Gullikson, Tony G. Smith, Leonard E. Klebanoff, Layton C. Hale, Henry N. Chapman, R. Lafon, Kenneth A. Goldberg, Sang Hun Lee, Joel R. Darnold, Yon E. Perras, William C. Replogle, Samuel Ponti, Steven J. Haney, John B. Wronosky, Terry A. Johnson, Kenneth A. Williams, Daniel A. Tichenor, Harry Shields, Therese L. Porter, James L. Van De Vreugde, Daniel L. Knight, W. P. Ballard, Luis J. Bernardez, Donna J. O'Connell, Randall J. St. Pierre, Dean A. Buchenauer, Kenneth L. Blaedel, Samuel Graham, G. E. Sommargren
Publikováno v:
SPIE Proceedings.
Full-field imaging with a developmental projection optic box (POB 1) was successfully demonstrated in the alpha tool Engineering Test Stand (ETS) last year. Since then, numerous improvements, including laser power for the laser-produced plasma (LPP)
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::70d0f48bae34ecc0bda1359d98956942
https://doi.org/10.1117/12.482791
https://doi.org/10.1117/12.482791
Autor:
Eric M. Gullikson, David Attwood, Donald W. Sweeney, Alvin H. Leung, Luis J. Bernardez, Guojing Zhang, William P. Ballard, Karen L. Jefferson, Patrick P. Naulleau, Eric M. Panning, Henry N. Chapman, Steven J. Haney, Terry A. Johnson, Kenneth A. Goldberg, Stefan Wurm, Daniel A. Tichenor, Pei-yang Yan, William C. Replogle, Donna J. O'Connell, John E. M. Goldsmith, Kenneth L. Blaedel, Glenn D. Kubiak, Charles W. Gwyn, John B. Wronosky, J. E. Bjorkholm, Sang Hun Lee
Publikováno v:
Emerging Lithographic Technologies VI.
Static and scanned images of 100 nm dense features were successfully obtained with a developmental set of projection optics and a 500W drive laser laser-produced-plasma (LPP) source in the Engineering Test Stand (ETS). The ETS, configured with POB1,
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::84d7aea6c6034f7debe6f1d7537b290c
https://doi.org/10.1117/12.472300
https://doi.org/10.1117/12.472300
Autor:
Alvin H. Leung, Terry A. Johnson, Samual Graham, David Attwood, Kenneth A. Goldberg, Leonard E. Klebanoff, John E. M. Goldsmith, Daniel A. Tichenor, Donald W. Sweeney, John B. Wronosky, Sang Hun Lee, Karen L. Jefferson, Glenn D. Kubiak, W. P. Ballard, Patrick P. Naulleau, John S. Taylor, James A. Folta, Gary E. Sommargren, Layton C. Hale, Harry Shields, Henry N. Chapman, William C. Replogle, Tony G. Smith, Eric M. Gullikson
Publikováno v:
Emerging Lithographic Technologies VI.
The EUV Engineering Test Stand (ETS) has demonstrated the printing of 100-nm-resolution scanned images. This milestone was first achieved while the ETS operated in an initial configuration using a low power laser and a developmental projection system
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9c088535fab5c49e547816b6357d6dfc
https://doi.org/10.1117/12.472328
https://doi.org/10.1117/12.472328
Autor:
Eric M. Gullikson, Kurt W. Berger, Pei-yang Yan, Leonard E. Klebanoff, Eberhard Spiller, John S. Taylor, Karen J. Jefferson, Ralph M. Hanzen, Donald W. Sweeney, Donna J. O'Connell, Henry N. Chapman, Regina Soufli, J. E. Bjorkholm, Richard H. Stulen, Alvin H. Leung, Glenn D. Kubiak, Kenneth L. Blaedel, John B. Wronosky, Avijit K. Ray-Chaudhuri, William C. Replogle, Eric M. Panning, Layton C. Hale, Daniel A. Tichenor, David Attwood, James A. Folta, Gary E. Sommargren, Uwe Mickan, Charles W. Gwyn, Jeffrey Bokor, W. P. Ballard, Patrick P. Naulleau, Sang Hun Lee, Kenneth A. Goldberg
Publikováno v:
SPIE Proceedings.
The Engineering Test Stand (ETS) is an EUV lithography tool designed to demonstrate full-field EUV imaging and provide data required to accelerate production-tool development. Early lithographic results and progress on continuing functional upgrades
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::40c79de470c2ca7e5a8870b5a87336d3
https://doi.org/10.1117/12.450953
https://doi.org/10.1117/12.450953
Autor:
Keith H. Jackson, Pei-yang Yan, Richard H. Stulen, Kenneth L. Blaedel, John B. Wronosky, Leonard E. Klebanoff, Avijit K. Ray-Chaudhuri, Daniel A. Tichenor, Paul D. Rockett, Eric M. Gullikson, Donald W. Sweeney, James A. Folta, Jeffrey Bokor, Henry N. Chapman, Claude Montcalm, Layton C. Hale, Regina Soufli, Kenneth A. Goldberg, Alvin H. Leung, Charles W. Gwyn, Glenn D. Kubiak, John S. Taylor, Gary E. Sommargren, Karen J. Jefferson, William C. Replogle, Eberhard Spiller, David Attwood, Phillip J. Batson, Scott Daniel Hector, Patrick P. Naulleau
Publikováno v:
SPIE Proceedings.
The Engineering Test Stand (ETS) is a developmental lithography tool designed to demonstrate full-field EUV imaging and provide data for commercial-tool development. In the first phase of integration, currently in progress, the ETS is configured usin
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3a87d43adbb9de9ffb67b8eab304bff3
https://doi.org/10.1117/12.436665
https://doi.org/10.1117/12.436665
Autor:
James A. Folta, Russell M. Hudyma, Henry N. Chapman, Layton C. Hale, Kenneth A. Goldberg, William C. Replogle, Claude Montcalm, John B. Wronosky, John S. Taylor, Leonard E. Klebanoff, Daniel A. Tichenor, Patrick P. Naulleau, Glenn D. Kubiak
Publikováno v:
SPIE Proceedings.
The Engineering Test Stand (ETS) is an EUV laboratory lithography tool. The purpose of the ETS is to demonstrate EUV full-field imaging and provide data required to support production-tool development. The ETS is configured to separate the imaging sy
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::df7d281da500efcdb602aa318e551942
https://doi.org/10.1117/12.390083
https://doi.org/10.1117/12.390083
Autor:
Kevin D. Krenz, William C. Sweatt, Glenn D. Kubiak, Donald W. Sweeney, Russell M. Hudyma, Harry Shields, Luis J. Bernardez, William C. Replogle
Publikováno v:
SPIE Proceedings.
A clean, high-power Extreme Ultraviolet (EUV) light source is being developed for Extreme Ultraviolet Lithography (EUVL). The source is based on a continuous jet of condensable gas irradiated with a diode-pumped solid state laser producing a time-ave
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::fcfb3c0d6e8828af1130117c68c164b3
https://doi.org/10.1117/12.371111
https://doi.org/10.1117/12.371111
Autor:
Ralph M. Hanzen, Layton C. Hale, Donald W. Sweeney, William C. Replogle, Eric M. Panning, Paul D. Rockett, Kenneth A. Goldberg, James A. Folta, Leonard E. Klebanoff, G. E. Sommargren, Alvin H. Leung, Patrick P. Naulleau, Eberhard Spiller, Donna J. O'Connell, Jeffrey Bokor, Pei-yang Yan, David Attwood, E. M. Gullikson, Glenn D. Kubiak, Daniel A. Tichenor, Henry N. Chapman, J. Taylor, Karen L. Jefferson, Richard H. Stulen, Kenneth L. Blaedel, John B. Wronosky, Avijit K. Ray-Chaudhuri, Uwe Mickan, Charles W. Gwyn, Sang H. Lee
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 19:2389
The extreme ultraviolet (EUV) Engineering Test Stand (ETS) is a step-and-scan lithography tool that operates at a wavelength of 13.4 nm. It has been developed to demonstrate full-field EUV imaging and acquire system learning for equipment manufacture
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c9b5705b5ae135b862fdd711f922a09c
https://doi.org/10.1116/1.1414017
https://doi.org/10.1116/1.1414017