Zobrazeno 1 - 10
of 14
pro vyhledávání: '"William A. Muth"'
Publikováno v:
Journal of Adolescent & Adult Literacy. 64:342-346
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e391b8e93dd38aad3ce2fe9570c7f08a
https://doi.org/10.1002/jaal.1101
https://doi.org/10.1002/jaal.1101
Autor:
Cynthia A. Hoey, David R. Andes, Chadi A. Hage, Jennifer L. Dotson, L. Joseph Wheat, David S. McKinsey, Rachel Miller, Steven D. Burdette, D. Kaul, Smyrna Abou Antoun, Kassem A. Hamoud, Maha A. Assi, Mary E. Money, William E. Muth, Alison G. Freifeld, Paschalis Vergidis, Frederick T. Steiner, Randall C. Walker, Thein Myint, David E. Liebers, Vidhya Prakash, Robin K. Avery, Jana Dickter
Publikováno v:
Clinical Infectious Diseases. 61:409-417
Background. Histoplasmosis may complicate tumor necrosis factor (TNF)–α blocker therapy. Published case series provide limited guidance on disease management. We sought to determine the need for long-term antifungal therapy and the safety of resum
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::015178b7d107d3da64301337d503f329
https://doi.org/10.1093/cid/civ299
https://doi.org/10.1093/cid/civ299
Publikováno v:
2010 18th International Conference on Advanced Thermal Processing of Semiconductors (RTP).
Throughout the history of rapid thermal processing the generation and subsequent elimination of crystalline slip has been an ongoing battle. The combination of high temperatures, temperature gradients, and strain rates typically present in RTP/RTA sy
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e5aae2b00561e7e5c8b742fbffcd3105
https://doi.org/10.1109/rtp.2010.5623803
https://doi.org/10.1109/rtp.2010.5623803
Publikováno v:
SPIE Proceedings.
With the introduction of double patterning, overlay capability below 5nm is required for optical lithography density scaling to the 22nm node and beyond. Commensurate overlay metrology must enable dense sampling of all patterned area to control singl
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b4499c0f6add10c7ebf4fce58e2b79a3
https://doi.org/10.1117/12.848002
https://doi.org/10.1117/12.848002
Autor:
Mark C. Kelling, Bernd Schulz, Jon-Tobias Hoeft, Matthew Sendelbach, William A. Muth, Benjamin Bunday, M. Zaitz, Andrew Brendler, Alok Vaid, Eric P. Solecky, Ron Fiege, Bill Banke, Srinivasan Rangarajan, Carlos Strocchia-Rivera, Andres Munoz, Carsten Hartig, John A. Allgair, Dmitriy Shneyder, Chas Archie
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography XXIII.
Ever shrinking measurement uncertainty requirements are difficult to achieve for a typical metrology toolset, especially over the entire expected life of the fleet. Many times, acceptable performance can be demonstrated during brief evaluation period
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::55aec1cd51f9aaf9d919e62dafa19930
https://doi.org/10.1117/12.814089
https://doi.org/10.1117/12.814089
Autor:
J. Schneider, Nigel Smith, Roger J. Yerdon, L. A. Binns, J. Morningstar, William A. Muth, Christopher P. Ausschnitt
Publikováno v:
SPIE Proceedings.
A novel overlay target developed by IBM and Accent Optical Technologies, Blossom, allows simultaneous overlay measurements of multiple layers (currently, up to 28) with a single target. This is achieved by a rotationally symmetric arrangement of smal
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a2f581de2eed83a8bd22ec140b8a3f42
https://doi.org/10.1117/12.659060
https://doi.org/10.1117/12.659060
Autor:
Nigel Smith, J. Morningstar, L. A. Binns, Christopher P. Ausschnitt, Roger J. Yerdon, William A. Muth, J. Schneider
Publikováno v:
SPIE Proceedings.
A novel approach to overlay metrology, called Blossom, maximizes the number of layers measurable within a single optical field of view (FOV). As chip processing proceeds, each layer contributes a set of at least four marks, arranged symmetrically on
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f1ee50dd0a999b0e98e578f9e15fd343
https://doi.org/10.1117/12.657397
https://doi.org/10.1117/12.657397
Autor:
William A. Muth, Christopher P. Ausschnitt, Brian C. Barker, Thomas Walentosky, Marc J. Postiglione
Publikováno v:
SPIE Proceedings.
Fully automated semiconductor manufacturing, becoming a reality with the ramping of 300mm fabricators throughout the world, demands the integration of advanced process control (APC). APC is particularly critical for the lithography sector, whose perf
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c19a1265160cce8edf694812e745ecdd
https://doi.org/10.1117/12.485310
https://doi.org/10.1117/12.485310
Autor:
Rafał L. Górny, William L. Muth, Atin Adhikari, Ronald K. Wolff, Tiina Reponen, Sergey A. Grinshpun, Paul M. Kovach
Publikováno v:
Journal of aerosol medicine : the official journal of the International Society for Aerosols in Medicine. 16(1)
Survival and growth of three model test bacterial species (Pseudomonas fluorescens, Staphylococcus epidermidis and Bacillus subtilis), present in the air and/or in the human respiratory tract, were tested in inhalable insulin-lactose powder under opt
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::22e69cdb5e09521387a9c73788b3890c
https://pubmed.ncbi.nlm.nih.gov/12737685
https://pubmed.ncbi.nlm.nih.gov/12737685
Autor:
Krzysztof W. Szewczyk, Klaus Willeke, Diane D. Elliott, Man-Juan Pan, William L. Muth, Matti Lehtimäki, Usha Krishnan
Publikováno v:
Biotechnology and Bioengineering. 39:243-245
A number of industrial processes require the addition of materials to the fermentation broth that are hazardous to health and environment. Agitation of broths inoculated with microorganisms can potentially release aerosols large enough to carry the m
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9b2baf314a4529939a24e8b6dfd8af15
https://doi.org/10.1002/bit.260390217
https://doi.org/10.1002/bit.260390217