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pro vyhledávání: '"Willem-Pieter Voorthuijzen"'
Autor:
Arnoud Willem Notenboom, P. J. van Zwol, W. Symens, Maxim A. Nasalevich, Maria Peter, Johan Hendrik Klootwijk, Willem-Pieter Voorthuijzen, R. W. E. van de Kruijs, David Ferdinand Vles, W. J. van der Zande, Evgenia Kurganova, Adrianus Johannes Maria Giesbers
Publikováno v:
Photomask Technology 2017
EUV pellicles are needed to support EUV lithography in high volume manufacturing. We demonstrate progress in cap layer design for increased EUV transmission and infrared emission of the Polysilicon-film. In our research lab we obtained EUV transmissi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::a7aa3b2c63968ad4203ed4248a064c92
https://research.utwente.nl/en/publications/03ba2447-f2e3-4748-82ad-c67678af4c8d
https://research.utwente.nl/en/publications/03ba2447-f2e3-4748-82ad-c67678af4c8d