Zobrazeno 1 - 4
of 4
pro vyhledávání: '"Willem van Mierlo"'
Autor:
Ziyang Wang, Mark John Maslow, Claire van Lare, Nadia Zuurbier, Andreas Frommhold, Rik Hoefnagels, Jo Finders, Eric Hendrickx, Zoi Dardani, Shih-Hsiang Liu, Scott L. Light, Ardavan Niroomand, Roberto Fallica, Willem van Mierlo, Dorothe Oorschot, Gijsbert Rispens
Publikováno v:
Extreme Ultraviolet (EUV) Lithography XI.
In this paper we show experimental verification of the feasibility of printing pitch 40x70nm hexagonal holes using EUV single patterning. We show that at a local CDU (LCDU) of 2.7nm and an exposure dose of 54 mJ/cm2 a defect rate smaller than 7x10-9
Autor:
Ruochong Fei, Dorothe Oorschot, Jin-Woo Lee, Marleen Kooiman, Hwan Kim, shu-yu lai, Jaehee Hwang, Kang-San Lee, Chang-Moon Lim, Marc Kea, Inhwan Lee, Willem van Mierlo, Ziyang Wang, Harm Dillen, Jung-Hyun Kang
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography XXXIII.
Introduction and problem statement Given that EUV lithography allows printing smaller Critical Dimension (CD) features, it can result in non-normal distributed CD populations on ADI wafers [Civay SPIE AL 2014], leading to errors in predicted failure
Autor:
Bart Smeets, Lei Zhang, Anita Bouma, Peter de Loijer, Willem van Mierlo, Wendy Liebregts, Bart Rijpers, Tran Thanh Thuy Vu, Goosen Maikel Robert
Publikováno v:
Optical Microlithography XXXI.
Scanner induced pattern shifts between layers are a large contributor to DRAM Bitline to Active overlay. One of the main root causes for this Pattern Shift non-Uniformity are lens aberrations. Currently measuring the Bitline to Active overlay require
Autor:
Ute Kaiser, Ludwig Jörissen, Willem van Mierlo, Santhana K. Eswaramoorthy, Prasanth Balasubramanian, Margret Wohlfahrt-Mehrens, Mario Marinaro, Jörg Bernhard
Publikováno v:
Microscopy and microanalysis : the official journal of Microscopy Society of America, Microbeam Analysis Society, Microscopical Society of Canada. 20(5)
A new in situ Scanning Electron Microscope-Focused Ion Beam-based method to study porous carbon electrodes involving Pt filling of pores from gaseous precursors has been demonstrated to show drastically improved image contrast between the carbon and