Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Will S. Rees"'
Publikováno v:
Chemical Vapor Deposition. 12:181-186
Hafnium oxynitride films were deposited using downstream microwave plasma-enhanced (DMPE) CVD in O 2 , N 2 O, O 2 /He, and N 2 O/N 2 with hafnium tetrakis-diethylamide (Hf(NCH 2 CH 3 ) 4 , TDEAH) as the precursor. The effects of plasma-activated oxid
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::adfb3d7415a2708305e9e8f61793583c
https://doi.org/10.1002/cvde.200506440
https://doi.org/10.1002/cvde.200506440
Publikováno v:
Chemical Vapor Deposition. 6:129-132
Dibutylmagnesium reacts with 2 equivalents of 5-N-(N,N-dimethylaminopropyl)-2,2,7-trimethyl-3-octanone in THF to afford the homoleptic bis(β-ketoiminate) compound 2. Its molecular structure, determined by the single-crystal X-ray diffraction techniq
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0cf1ae7a598123ead6d2219c68d15c27
https://doi.org/10.1002/(sici)1521-3862(200006)6:3<129::aid-cvde129>3.0.co
https://doi.org/10.1002/(sici)1521-3862(200006)6:3<129::aid-cvde129>3.0.co
Publikováno v:
Journal of The Electrochemical Society. 153:F1
Nitrided HfO 2 films are deposited by direct liquid injection chemical vapor deposition (CVD) using O 2 or N 2 O as oxidants. Deposition kinetics, phase, chemical composition, bonding, and dielectric properties of the films obtained from the two diff
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b0dfb37dac695d62d9196582a08c2432
https://doi.org/10.1149/1.2128119
https://doi.org/10.1149/1.2128119