Zobrazeno 1 - 10
of 234
pro vyhledávání: '"Wilhelmus M M, Kessels"'
Autor:
Yifeng Zhao, Kunal Datta, Nga Phung, Andrea E. A. Bracesco, Valerio Zardetto, Giulia Paggiaro, Hanchen Liu, Mohua Fardousi, Rudi Santbergen, Paul Procel Moya, Can Han, Guangtao Yang, Junke Wang, Dong Zhang, Bas T. van Gorkom, Tom P. A. van der Pol, Michael Verhage, Martijn M. Wienk, Wilhelmus M. M. Kessels, Arthur Weeber, Miro Zeman, Luana Mazzarella, Mariadriana Creatore, René A. J. Janssen, Olindo Isabella
Publikováno v:
ACS Applied Energy Materials, 6(10), 5217-5229. American Chemical Society
Monolithic perovskite/c-Si tandem solar cells have attracted enormous research attention and have achieved efficiencies above 30%. This work describes the development of monolithic tandem solar cells based on silicon heterojunction (SHJ) bottom- and
Autor:
Jeroen G. A. van Kasteren, Saravana B. Basuvalingam, Miika Mattinen, Andrea E. A. Bracesco, Wilhelmus M. M. Kessels, Ageeth A. Bol, Bart Macco
Publikováno v:
Chemistry of Materials, 34(17), 7750-7760. American Chemical Society
In this work, atomic layer deposition (ALD) has been employed to prepare titanium oxysulfide (TiOxSy) thin films. Compositional control was achieved through a supercycle approach, where the ALD processes of TiOx and TiSx were interleaved. ALD was per
Autor:
Roel J. Theeuwes, Jimmy Melskens, Wolfhard Beyer, Uwe Breuer, Astrid Gutjahr, Agnes A. Mewe, Bart Macco, Wilhelmus M. M. Kessels
Publikováno v:
Journal of Applied Physics, 133(14):145301. American Institute of Physics
Polysilicon (poly-Si) passivating contacts have enabled some of the highest lab-scale crystalline silicon (c-Si) solar cell conversion efficiencies, largely due to their excellent surface passivation quality, which can be aided by means of hydrogenat
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::19cddcdde3a56ac298a07320b2aa5d8d
https://research.tue.nl/nl/publications/888158bd-28ca-4d05-820e-3ae219ed61ec
https://research.tue.nl/nl/publications/888158bd-28ca-4d05-820e-3ae219ed61ec
Publikováno v:
The Journal of Physical Chemistry. C, Nanomaterials and Interfaces
Journal of Physical Chemistry C, 125(45), 24945-24957. American Chemical Society
Journal of Physical Chemistry C, 125(45), 24945-24957. American Chemical Society
An atmospheric-pressure plasma-enhanced spatial atomic layer deposition (PE-s-ALD) process for SiO2 using bisdiethylaminosilane (BDEAS, SiH2[NEt2]2) and O2 plasma is reported along with an investigation of its underlying growth mechanism. Within the
Autor:
Bart Macco, Wilhelmus J. H. Berghuis, Jimmy Melskens, Wolfhard Beyer, Lachlan E. Black, Dibyashree Koushik, Wilhelmus M. M. Kessels, Roel J. Theeuwes
Publikováno v:
ACS applied electronic materials 3(10), 4337-4347 (2021). doi:10.1021/acsaelm.1c00516
ACS Applied Electronic Materials, 3(10), 4337-4347. American Chemical Society
ACS Applied Electronic Materials
ACS Applied Electronic Materials, 3(10), 4337-4347. American Chemical Society
ACS Applied Electronic Materials
Phosphorus oxide (PO x ) capped by aluminum oxide (Al2O3) has recently been discovered to provide excellent surface passivation of crystalline silicon (c-Si). In this work, insights into the passivation mechanism of PO x /Al2O3 stacks are gained thro
Autor:
Nga Phung, Cristian van Helvoirt, Wolfhard Beyer, John Anker, Ronald C. G. Naber, Marten Renes, Wilhelmus M. M. Kessels, L. J. Geerligs, Mariadriana Creatore, Bart Macco
Publikováno v:
IEEE Journal of Photovoltaics, 12(6), 1377-1385. IEEE Electron Devices Society
In recent years, passivating contacts based on SiO 2 /poly-Si have proven to be an enabling technology for Si solar cells. Effective hydrogenation of the interfacial SiO 2 is vital for realizing efficient contacts. Hydrogen-rich dielectrics, such as
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::6437d4cb235deb9c9cce12defa6a69ce
https://research.tue.nl/nl/publications/a4186b85-c33c-48d8-8f88-faf734d8f218
https://research.tue.nl/nl/publications/a4186b85-c33c-48d8-8f88-faf734d8f218
Autor:
Marcel A. Verheijen, Reyhaneh Mahlouji, Abhay A. Sagade, Yue Zhang, Jan P. Hofmann, Wilhelmus M. M. Kessels, Ageeth A. Bol
Publikováno v:
ACS Applied Electronic Materials, 3(7), 3185-3199. American Chemical Society
Despite the extensive ongoing research on MoS2 field effect transistors(FETs), the key role of device processing conditions in the chemistry involved at the metalto-MoS2 interface and their influence on the electrical performance are often overlooked
Publikováno v:
Physical Chemistry Chemical Physics, 23(15), 9304-9314. Royal Society of Chemistry
Lithium fluoride films were prepared by atomic layer deposition (ALD) using a new route in which LiN(SiMe3)2 is used as a precursor and SF6 plasma as a coreactant. Conformal LiF films were deposited at 150 °C at a growth rate of ∼0.4 A per cycle.
Autor:
Marcel A. Verheijen, Matthew A. Bloodgood, Wilhelmus M. M. Kessels, Saravana Balaji Basuvalingam, Ageeth A. Bol
Publikováno v:
ACS Applied Nano Materials, 4(1), 514-521. American Chemical Society
ACS Applied Nano Materials
ACS Applied Nano Materials
The scalable and conformal synthesis of two-dimensional (2D) transition metal dichalcogenide (TMDC) heterostructures is apersisting challenge for their implementation in next-generation devices.In this work, we report the synthesis of nanometer-thick
Autor:
Vivek Beladiya, Tahsin Faraz, Paul Schmitt, Anne-Sophie Munser, Sven Schröder, Sebastian Riese, Christian Mühlig, Daniel Schachtler, Fabian Steger, Roelene Botha, Felix Otto, Torsten Fritz, Christian van Helvoirt, Wilhelmus M. M. Kessels, Hassan Gargouri, Adriana Szeghalmi
Publikováno v:
ACS Applied Materials & Interfaces, 14(12), 14677-14692. American Chemical Society
Tuning ion energies in plasma-enhanced atomic layer deposition (PEALD) processes enables fine control over the material properties of functional coatings. The growth, structural, mechanical, and optical properties of HfO2 thin films are presented in
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::9b846441c3674e20436e96a27f07ef5d
https://research.tue.nl/nl/publications/19d530ec-533e-4d10-b445-d1e73db5fe26
https://research.tue.nl/nl/publications/19d530ec-533e-4d10-b445-d1e73db5fe26