Zobrazeno 1 - 6
of 6
pro vyhledávání: '"Wilhelm H. Brünger"'
Publikováno v:
Microelectronic Engineering. 83:819-822
Persistent surface morphologies in extruded polymer substrates can be generated in a first step by projecting a mask with argon ions and, secondly, by a consecutive exposure to solvent. In the first step, the polymer is locally cross-linked as a cons
Autor:
M. Zierbock, Bernd Schnabel, Wilhelm H. Brünger, R. Plontke, Ernst-Bernhard Kley, I. Stolberg
Publikováno v:
Microelectronic Engineering. 27:135-138
The paper describes an electron beam lithography system for structures as small as 10nm and pattern samples produced on it. The system works with electron energies from 20keV down to 1keV. A special objective lens allows to realize probes of 5nm diam
Autor:
Andreas Dietzel, Rüdiger Berger, Wilhelm H. Brünger, Yogesh Karade, Karlheinz Graf, Sascha A. Pihan
Publikováno v:
Langmuir, 25(5), 3108-3114. American Chemical Society
The irradiation of polymer surfaces with ion beams leads to pronounced chemical and physical modifications when the ions are scattered at the atoms in the polymer chain. In this way, different products of decomposition occur. Here we show that by cha
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::cfd661fc762120e33b317eab616db508
https://research.tue.nl/nl/publications/9ce532b2-2a10-4f10-9c26-4e428c0be33d
https://research.tue.nl/nl/publications/9ce532b2-2a10-4f10-9c26-4e428c0be33d
Publikováno v:
Microelectronic Engineering, 84(5-8), 797-801. Elsevier
We present a technique to fabricate polymer substrates with locally structured surfaces in the nanometer scale. By ion projection direct cross-linking the surface of a stretched polymer is locally cross-linked and afterwards annealed above the glass
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::3fc1e1048e2461d8ff2ab32effba82c9
https://publica.fraunhofer.de/handle/publica/213393
https://publica.fraunhofer.de/handle/publica/213393
Autor:
Yogesh Karade, Sascha A. Pihan, Wilhelm H. Brünger, Andreas Dietzel, Rüdiger Berger, Karlheinz Graf
Publikováno v:
Langmuir; Mar2009, Vol. 25 Issue 5, p3108-3114, 7p
Autor:
Wilhelm H. Brünger
Publikováno v:
Microelectronic Engineering. 9:171-174
The electron beam induced metal deposition is a powerful technique to repair clear X-ray mask defects in the sub-μm range. The initial growth rate of dots deposited at 10 keV e-beam energy and 3 nA/μm 2 current density was 10 nm/sec. Dots of differ