Investigation of organic precursors and plasma mixtures allowing control of carbon passivation when etching HgCdTe in hydrocarbon-based inductively coupled plasmas

Autor: François Boulard, Aurélie Girard, Wilfrid Faider, Christophe Cardinaud, Jordan Piet

Publikováno v: Journal of Vacuum Science and Technology A
Journal of Vacuum Science and Technology A, American Vacuum Society, 2020, 38 (5), pp.053005. ⟨10.1116/6.0000397⟩
Journal of Vacuum Science & Technology A
Journal of Vacuum Science & Technology A, 2020, 38 (5), pp.053005. ⟨10.1116/6.0000397⟩

International audience; ABSTRACTOur interest in introducing oxygen and/or nitrogen atoms in CH4/H2/Ar plasma mixtures by means of organic precursors in the place of CH4 or by partly substituting O2 or N2O for H2 and thereby controlling carbon deposit

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::14712667385fa1ce00a17033e8ee7b6c
https://hal.archives-ouvertes.fr/hal-03010318/file/JVA20-AR-COBURN2020-00284-1.pdf