A study of the chemical and physical effects of ion implantation of micro-porous and nonporous PTFE

Autor: Colwell, J.M. ^*, Wentrup-Byrne, E., Bell, J.M., Wielunski, L.S.

Publikováno v: In Surface & Coatings Technology 2003 168(2):216-222

Optimal geometry for GeSi/Si super-lattice structure RBS investigation

Autor: Wielunski, L.S., Osipowicz, T., Teo, E.J., Watt, F., Tok, E.S., Zhang, J.

Publikováno v: In Nuclear Inst. and Methods in Physics Research, B 2002 190(1):414-418

Depth profiling of nitrogen implanted into Si/C and Zr/C bilayers with nuclear reaction analysis

Autor: Miyagawa, Y ^*, Nakao, S, Wielunski, L.S, Hasegawa, H, Miyagawa, S

Publikováno v: In Nuclear Inst. and Methods in Physics Research, B 2000 161:997-1001

Characterization of mechanical properties of VO 2 thin films on sapphire and silicon by ultra-microindentation

Autor: Jin, P., Nakao, S., Tanemura, S., Bell, T., Wielunski, L.S., Swain, M.V.

Publikováno v: In Thin Solid Films 1999 343:134-137

In-situ infrared absorption spectroscopy of HfO2 growth by atomic layer deposition on Si(100) and Si(111)

Autor: Wang, Y., Chabal, Y.J., Ho, M.T., Wielunski, L.S., Goncharova, L., Gustafsson, T., Larrieu, G., Tao, M., Boleslawski, M., Moumen, N.

Publikováno v: Proceedings of the AVS 5th International Conference on Atomic Layer Deposition, ALD 2005
Proceedings of the AVS 5th International Conference on Atomic Layer Deposition, ALD 2005, 2005, San Jose, CA, United States

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::a5644d99deafa419f5d7fc33ad8dde2e
https://hal.archives-ouvertes.fr/hal-00139248