Zobrazeno 1 - 2
of 2
pro vyhledávání: '"Whee Won Cho"'
Publikováno v:
Thin Solid Films. 519:6662-6666
We investigated the mechanism of cracking between the inter/intra-metallic dielectric (IMD) silicon oxide films after anneal process. The cracks were initiated at the top corner of aluminum lines, then propagated through the silicon oxide films. Thus
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0a908d2c59b79118029a55e4636d0f4d
https://doi.org/10.1016/j.tsf.2011.04.136
https://doi.org/10.1016/j.tsf.2011.04.136
Publikováno v:
2007 22nd IEEE Non-Volatile Semiconductor Memory Workshop.
In IMD study Rs reduction and better uniformity as well as lower capacitance were achieved in 60 nm 2 Giga Bit NAND flash memory. It alos fabricated 70 % air-gap of gate and calculated interference reduction in 45 nm device when it was applied throug
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::909724f4f173594a42bfc0f4bab8f17b
https://doi.org/10.1109/nvsmw.2007.4290578
https://doi.org/10.1109/nvsmw.2007.4290578