Aqueous Fluoride Residue Removers for 32 nm and beyond Copper Ultra Low-κ Technologies

Autor: Westwood, Glen, Pigliucci, Anatolio, Oszinda, Thomas, Leppack, Susanne, Schaller, Matthias

Publikováno v: Diffusion and Defect Data Part B: Solid State Phenomena; April 2012, Vol. 187 Issue: 1 p249-252, 4p