Zobrazeno 1 - 4
of 4
pro vyhledávání: '"Werner Saule"'
Publikováno v:
SPIE Proceedings.
Today, haze and crystal growth on the reticle surface are still a primary concern of the microlithography industry. The crystals limit the reticle usage as they result in printable defects on the wafers. Numerous studies have been presented so far. T
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e4c3ddf26c4827ed93d711f20953fb32
https://doi.org/10.1117/12.632055
https://doi.org/10.1117/12.632055
Autor:
Lothar Berger, Werner Saule, Hung-Chang Hsieh, Thomas Gairing, Peter Dress, Hsin-Chang Lee, Chia-Jen Chen
Publikováno v:
SPIE Proceedings.
Progress towards 65 nm next-generation lithography requires unprecedented global CD uniformity, with the actual ITRS 2002 roadmap proposing 4.2 nm 3/spl sigma/ (dense lines) for 65 nm binary masks. Since resolution requirements are satisfied only by
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::f4ab60924b2a25fe3ce7e1887be7075b
https://doi.org/10.1117/12.557714
https://doi.org/10.1117/12.557714
Autor:
Werner Saule, Anatol Schwersenz, Christian Buergel, Marlene Strobl, Peter Dress, Martin Tschinkl
Publikováno v:
SPIE Proceedings.
With shrinking feature sizes there is a growing demand for improved uniformity values and defect levels especially for aqueous develop during photomask processing. Standard nozzle systems with discrete dispense channels for applying the developer med
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9328848673e190ed806f0d484d855086
https://doi.org/10.1117/12.504190
https://doi.org/10.1117/12.504190
Publikováno v:
SPIE Proceedings.
A new type of bake system for photomasks, APB5000, has been developed, using a dynamic and multiple zone approach, to enable more precise Post Exposure Bake (PEB) and Post Coat Bake (PCB) of conventional and chemically amplified resists (CAR). The pr
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::64622459bb4f1cbb797db59a691fb205
https://doi.org/10.1117/12.438353
https://doi.org/10.1117/12.438353