Zobrazeno 1 - 10
of 14
pro vyhledávání: '"Wenjin Shao"'
Autor:
Zhihong Yang, Yongzhen Miao, Chuanxia Ju, Lei Wang, Naidong Wang, Ruoyu Zhang, Zihan Xu, Wenjin Shao, Fang Zhang
Publikováno v:
Journal of Neuroimmune Pharmacology. 14:519-529
Neuroinflammation plays an early and prominent role in the pathology of Alzheimer's disease (AD). Tumor necrosis factor-α-induced protein 8-like 2 (TIPE2) has been identified as a negative regulator of innate and adaptive immunity. However, whether
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::0dc9f22505ac86c70bd8f37d9cc15ba5
https://doi.org/10.1007/s11481-019-09861-2
https://doi.org/10.1007/s11481-019-09861-2
Autor:
Albert Macovski, Guodong Wang, Steven M. Conolly, E. W. Hughes, Greig C. Scott, Raymond Fuzesy, Blaine A. Chronik, Wenjin Shao
Publikováno v:
Applied Physics Letters. 80:2032-2034
Using a low-field magnetic resonance scanner, we have obtained images of gaseous polarized 129Xe and water cells at room temperature. This potentially low-cost imaging technique offers the possibility of high-resolution imaging using both polarized n
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::211adcd666bc4fc7e7c665e058c09739
https://doi.org/10.1063/1.1459759
https://doi.org/10.1063/1.1459759
Autor:
L. Van Look, J. T. Neumann, Bart Laenens, Koen D'havé, Wenjin Shao, Koen Schreel, Justin Ghan, Joost Bekaert, P. van Adrichem, Geert Vandenberghe
Publikováno v:
SPIE Proceedings.
IC manufacturers have a strong demand for transferring a working process from one scanner to another. Recently, a programmable illuminator (FlexRayTM) became available on ASML ArF immersion scanners that, besides all the parameterized source shapes o
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::34fa79bd162f9ad9c75e6ce07909d575
https://doi.org/10.1117/12.881607
https://doi.org/10.1117/12.881607
Autor:
Yee Mei Foong, Nanshu Chen, Yingfang Wang, Jacky Cheng, Jianhong Qiu, Dongqing Zhang, Yuyang Sun, Shaowen Gao, Byoung Il Choi, Wenjin Shao, Antoine J. Bruguier, Mu Feng, Liang Liu, Stefan Hunsche
Publikováno v:
SPIE Proceedings.
With shrinking feature sizes and error budgets in OPC models, effective pattern coverage and accurate measurement become more and more challenging. The goal of pattern selection is to maximize the efficiency of gauges used in model calibration. By op
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5a74301b40a9e7687e4f39cef12fd47c
https://doi.org/10.1117/12.881575
https://doi.org/10.1117/12.881575
Autor:
Wenjin Shao, Dorothe Oorschot, Xu Xie, Youri van Dommelen, Henry Megens, Robert John Socha, Venu Vellanki
Publikováno v:
SPIE Proceedings.
FlexRay programmable illumination and LithoTuner software is combined in several use cases. The first use case is optical proximity error (OPE) minimization. Simulation predicts the rms OPE error is reduced by 39% with LithoTuner and FlexRay, and is
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::dfb68400066b844e8f9b929f3f290046
https://doi.org/10.1117/12.879619
https://doi.org/10.1117/12.879619
Autor:
Junwei Lu, Seung-Hoon Park, Kyung Kang, Stefan Hunsche, Yu Cao, Fei Du, John Barbuto, Zongchang Yu, Zhengfan Zhang, Chris Park, Jong-Ho Lim, Wenjin Shao, Sung-Man Kim, Venu Vellanki, Ronald Goossens
Publikováno v:
SPIE Proceedings.
Proximity matching is a common activity in the wafer fabs 1,2,3 for purposes such as process transfer, capacity expansion, improved scanner yield and fab productivity. The requirements on matching accuracy also become more and more stringent as CD er
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a37463625fe6e0bdea8b0769ca757e80
https://doi.org/10.1117/12.881680
https://doi.org/10.1117/12.881680
Autor:
Xiaoxu Xie, R. C. Peng, John Lin, H. J. Lee, Chia-Yang Chang, Rafael Aldana, Simon Hsieh, Chih-Tsung Shih, H. H. Liu, Ronald Goossens, W. H. Hung, Wenjin Shao, H. C. Wu, Chii-Ming M. Wu, Yi-Yin Chen, Y. Cao, Tommy Lee, Tsung-Chih Chien, K. W. Chang
Publikováno v:
27th European Mask and Lithography Conference.
Given the continually decreasing k1 factor and process latitude in advanced technology nodes, it is important to fully understand and control the variables that impact imaging behavior in the lithography process. In this joint work between TSMC and A
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::bb9f9a764ae9d934ae6a29172953c0c3
https://doi.org/10.1117/12.882764
https://doi.org/10.1117/12.882764
Autor:
Vinay Nair, Xu Xie, Eric Janda, Zhongchang Yu, Rafael Aldana, Anton J. deVilliers, Yuan He, Mike Hyatt, Erik Byers, Y. Cao, Tjitte Nooitgedagt, Peter Engblom, Hua-yu Liu, Danielle Hines, Wenjin Shao, Junwei Lu, Chang-Qun Ma, Chris Aquino, Scott L. Light, Jianming Zhou, Ronald Goossens
Publikováno v:
SPIE Proceedings.
Scanner matching based on wafer data has proven to be successful in the past years, but its adoption into production has been hampered by the significant time and cost overhead involved in obtaining large amounts of statistically precise wafer CD dat
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::bffb74cbf9ed804f30a179b56ea81608
https://doi.org/10.1117/12.848255
https://doi.org/10.1117/12.848255
Autor:
Hsin-Chang Lee, Rafael Aldana, C. P. Yeh, Xu Xie, R. C. Peng, Simon Hsieh, Chih-Tsung Shih, A. Bruguier, John Lin, H. Cao, Y. W. Guo, Ching-Yu Chang, Ronald Goossens, P. C. Huang, H. H. Liu, Tsung-Chih Chien, Y. Cao, Jen-Tin Lee, K. W. Chang, Wenjin Shao, Chia-Yang Chang
Publikováno v:
SPIE Proceedings.
Given the decrease in k1 factor for 65nm-node lithography technology and beyond, it is increasingly important to understand and control the variables which impact scanner imaging behavior in the lithography process. In this work, we explore using mod
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::21a6d04acc1cdf2a1adcb0f41abe2cfd
https://doi.org/10.1117/12.813974
https://doi.org/10.1117/12.813974
Autor:
Hua-yu Liu, J. Fung Chen, Yu Cao, Jiong Jiang, Hua Cao, Eelco van Setten, Geert Vandenberghe, Robert John Socha, Lieve Van Look, Wenjin Shao, Mu Feng, Michael Crouse, Andre Engelen, Jo Finders, Jeroen Meessen, Joost Bekaert, Qian Zhao
Publikováno v:
SPIE Proceedings.
The challenge for the upcoming full-chip CD uniformity (CDU) control at 32nm and 22nm nodes is unprecedented with expected specifications never before attempted in semiconductor manufacturing. To achieve these requirements, OPC models not only must b
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a306435c22d8a7f6b0d5b5003d201647
https://doi.org/10.1117/12.793039
https://doi.org/10.1117/12.793039