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pro vyhledávání: '"Weng-Jin Wu"'
Autor:
Weng-Jin Wu, Min-Hsiung Hon
Publikováno v:
Thin Solid Films. 345:200-207
The silicon-containing diamond-like carbon film was deposited by r.f. plasma CVD with reactant gases of CH4, SiH4 and Ar on the substrates of silicon wafer, Corning 7059 glass and Ti–6Al–4V alloy respectively. In this study, the effects of residu
Autor:
Weng-Jin Wu, Min-Hsiung Hon
Publikováno v:
Surface and Coatings Technology. 111:134-140
Diamond-like carbon (DLC) films with added silicon content from 0 to 19.2 at.% were deposited using r.f. PECVD (radio frequency plasma enhanced chemical vapor deposition). Fourier transform IR (FTIR) spectrometry, Raman spectrometry and X-ray photoel
Autor:
Min-Hsiung Hon, Weng-Jin Wu
Publikováno v:
Thin Solid Films. 307:1-5
Silicon (Si) containing diamond-like carbon films are deposited by RF plasma CVD with reactant gases of CH4, SiH4 and Ar. The effects of substrate temperature and RF power on film structure, residual stress and adhesion are studied. The tensile crack
Autor:
Wen-Chih Chiou, Weng-Jin Wu, Hun-Hsien Chang, Kuo-Nan Yang, Hung-Jung Tu, C.H. Yu, Jung-Chih Hu
Publikováno v:
2008 International Interconnect Technology Conference.
A three dimensional integrated circuit (3DIC) integration flow, process and electrical results are reported. Well-controlled high aspect ratio (AR=8:1 and AR=15:1) through silicon vias (TSVs) were successfully filled with both copper (Cu) and tungste
Publikováno v:
CLEO/Pacific Rim 2003. The 5th Pacific Rim Conference on Lasers and Electro-Optics (IEEE Cat. No.03TH8671).
This paper describes a 4-channel parallel optical receiver module with a MPO-Connector designed for a very short reach OC-192 specifications. The discussion is addressed on optical design, package and measurement. The applicability of 4-channel paral
Autor:
Weng-Jin Wu, Min-Hsiung Hon
Publikováno v:
MRS Proceedings. 555
The diamond-like carbon (DLC) films added with silicon content from Oat% to 19.2at% were deposited using R.F. PECVD. By increasing the annealing temperature the groups of CHn and Si-H in FTIR spectra of the deposited films decrease because of hydroge
Publikováno v:
CLEO/Pacific Rim 2003. the 5th Pacific Rim Conference on Lasers & Electro-Optics (IEEE Cat. No.03TH8671); 2003, p592-592, 1p