Zobrazeno 1 - 10
of 60
pro vyhledávání: '"Wenchang Yeh"'
Publikováno v:
Nature Communications, Vol 13, Iss 1, Pp 1-8 (2022)
The field-effect mobility of oxide semiconductor thin-film transistors is not sufficiently high compared to silicon thin-film transistors. Magari et al. use a low-temperature solid-phase crystallization process to fabricate In2O3 thin-film transistor
Externí odkaz:
https://doaj.org/article/01b615e296324cf1a4edbe6ed5fc6b17
Publikováno v:
Nanomaterials, Vol 12, Iss 17, p 2958 (2022)
Hydrogenated polycrystalline In2O3 (In2O3:H) thin-film transistors (TFTs) fabricated via the low-temperature solid-phase crystallization (SPC) process with a field-effect mobility (μFE) exceeding 100 cm2 V−1 s−1 are promising candidates for futu
Externí odkaz:
https://doaj.org/article/e861354c261e49eaa8ac5c33865e4b77
Improvement of dielectric and ferroelectric properties by laser sintering of pulsed EPD BaTiO3 films
Publikováno v:
Ceramics International. 49:12745-12749
Publikováno v:
ACS applied materials & interfaces, vol 14, iss 44
The use of a laser with a Gaussian-beam profile is frequently adopted in attempts of crystallizing nonsingle-crystal thin films; however, it merely results in the formation of polycrystal thin films. In this paper, selective area crystallization of n
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::35f93f6a4af00df73d7d10b2d3b95bfe
https://escholarship.org/uc/item/4z94m2b9
https://escholarship.org/uc/item/4z94m2b9
Autor:
Wenchang Yeh
Publikováno v:
Green Photonics and Smart Photonics ISBN: 9781003338338
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::98ec847674ef2e4773e39744f09e0d27
https://doi.org/10.1201/9781003338338-4
https://doi.org/10.1201/9781003338338-4
Publikováno v:
2022 29th International Workshop on Active-Matrix Flatpanel Displays and Devices (AM-FPD).
Publikováno v:
Journal of Materials Science. 55:14105-14111
Crystallization of thin film materials by exploiting laser-induced crystallization has been advancing for the past four decades. This unique thin film technique has pedominantly been used in processing thin film semiconductor materials made of a sing
Autor:
Wenchang Yeh, Masato Ohya
Publikováno v:
Japanese Journal of Applied Physics. 62:SC1067
A fully depleted silicon-on-insulator (FD-SOI) MOSFET using a low-temperature sputtering SiO2 gate insulator (GI) was fabricated via a resistless process without a cleanroom. The resultant average characteristics with standard deviations were field-e
Publikováno v:
Proceedings of the International Display Workshops. :120
Publikováno v:
ECS Meeting Abstracts. :1277-1277
Oxide semiconductors have been extensively studied as active channel layers of thin-film transistors (TFTs) for electronic applications. However, the field-effect mobility (μ FE) of oxide TFTs is not sufficiently high to compete with that of low-tem