Zobrazeno 1 - 10
of 24
pro vyhledávání: '"Wen-Jie Zhai"'
Publikováno v:
Nature Communications, Vol 7, Iss 1, Pp 1-13 (2016)
Liver tumour-initiating cells (TICs) may be responsible for liver cancer initiation and recurrence. In this article, the authors show that a previously unidentified lncRNA, LncSox4, is highly expressed in liver cancer TICs and regulates TIC self-rene
Externí odkaz:
https://doaj.org/article/af4da882b3d24660a0f557ced5498b6f
Autor:
Xiu-Man Zhou, Wan-Qiong Li, Ya-Hong Wu, Lu Han, Xin-Guang Cao, Xuan-Ming Yang, Hong-Fei Wang, Wen-Shan Zhao, Wen-Jie Zhai, Yuan-Ming Qi, Yan-Feng Gao
Publikováno v:
Frontiers in Immunology, Vol 9 (2018)
TIGIT, an immune checkpoint molecule widely expressed on NK cells, activated T cells and Tregs, has been involved in delivering inhibitory signals through the interaction with PVR. The blockade of TIGIT/PVR interaction is a promising approach in canc
Externí odkaz:
https://doaj.org/article/1386dcba6fc24a179601f02e399bdfea
Publikováno v:
ICBK
Sequence pattern discovery is a key issue in multivariate time series analysis. Popular methods consist of three stages: feature extraction, feature clustering, and block sequence discovery. Both cross and temporal associations are obtained during th
Publikováno v:
Journal of Central South University. 21:4157-4162
Low dielectric constant materials/Cu interconnects integration technology provides the direction as well as the challenges in the fabrication of integrated circuits (IC) wafers during copper electrochemical-mechanical polishing (ECMP). These challeng
Autor:
Wen Jie Zhai, Jin Hu Wang
Publikováno v:
Advanced Materials Research. 1017:423-428
The tribo-electrochemical performance of polycrystalline silicon was studied by Tafel polarization curves and electrochemical impedance spectroscopy (EIS), based on which the electrochemical mechanical planarization (ECMP) simulating test was done to
Publikováno v:
Journal of Central South University. 21:2191-2201
The optimization of electrolytes and the material removal mechanisms for Cu electrochemical mechanical planarization (ECMP) at different pH values including 5-methyl-1H-benzotriazole (TTA), hydroxyethylidenediphosphoric acid (HEDP), and tribasic ammo
Publikováno v:
Rare Metals. 39:1300-1306
Electrochemical mechanical polishing (ECMP) is a new and highly promising technology. A specific challenge for integrating Ru as barrier in Cu interconnect structures is the galvanic corrosion of Cu that occurs during ECMP. To mitigate the problem, t
Publikováno v:
Transactions of Nonferrous Metals Society of China. 23:2431-2438
According to the electrochemical analysis, the corrosion inhibition efficiency of 5-methyl-1H-benzotriazole ( m -BTA) is higher than that of benzotrizaole (BTA). The inhibition capability of the m -BTA passive film formed in hydroxyethylidenediphosph
Autor:
Wen Jie Zhai, Jin Hu Wang
Publikováno v:
Applied Mechanics and Materials. 274:471-474
The influence of corrosion inhibitor BTA, chloride ion and anodic potential on the formation of copper passivation film was studied in the electrolyte of 18wt% HEDP by using Linear Sweep Voltammetry (LSV) and electrochemical impedance spectroscopy (E
Publikováno v:
Current Nanoscience. 8:676-679