Zobrazeno 1 - 10
of 13
pro vyhledávání: '"Wei-Hsiang Cheng"'
Autor:
Wei-Hsiang Cheng, 程韋翔
102
Phononic crystals is composed of a periodic array of several materials. In some frequency ranges, the propagation of elastic waves is forbidden in phononic crystals, and this phenomenon is called band gap. In order to reduce the energy loss
Phononic crystals is composed of a periodic array of several materials. In some frequency ranges, the propagation of elastic waves is forbidden in phononic crystals, and this phenomenon is called band gap. In order to reduce the energy loss
Externí odkaz:
http://ndltd.ncl.edu.tw/handle/62968142828575498600
Autor:
Wei-Hsiang Cheng, 鄭偉祥
101
hMMS21 also called Nse2 (non-SMC element 2) is a SUMO E3 ligase. According to the research, MMS21 plays a role in DNA damage repair. Our previous study demonstrated that hMMS21 depletion in MCF7 breast cancer cells reduced E2F1 protein level
hMMS21 also called Nse2 (non-SMC element 2) is a SUMO E3 ligase. According to the research, MMS21 plays a role in DNA damage repair. Our previous study demonstrated that hMMS21 depletion in MCF7 breast cancer cells reduced E2F1 protein level
Externí odkaz:
http://ndltd.ncl.edu.tw/handle/16265403591947728104
Autor:
Wei-Hsiang Cheng, 鄭維翔
100
In recent years, due to continue to improve semiconductor manufacturing process technology, System-on-Chip(SoC) have been proposed, SoC is the concept of a shared bus. However, functions and components on a single chip become more increase a
In recent years, due to continue to improve semiconductor manufacturing process technology, System-on-Chip(SoC) have been proposed, SoC is the concept of a shared bus. However, functions and components on a single chip become more increase a
Externí odkaz:
http://ndltd.ncl.edu.tw/handle/h9859c
Autor:
Wei-Hsiang Cheng, 鄭偉祥
97
Chemical mechanical polishing (CMP) is the mostly used planarization process in the semiconductor industry today. Due to the dual actions of chemicals corrosion and abrasive abrasion in the slurry, CMP achieves the effect of global planarizat
Chemical mechanical polishing (CMP) is the mostly used planarization process in the semiconductor industry today. Due to the dual actions of chemicals corrosion and abrasive abrasion in the slurry, CMP achieves the effect of global planarizat
Externí odkaz:
http://ndltd.ncl.edu.tw/handle/54196199112206552893
Autor:
Wei-Hsiang Cheng, 程偉祥
94
The Mobile Ad hoc NETwork (MANET) is a kind of network without the existence of infrastructure. The mobile nodes (MNs) in the MANET can exchange their data packets directly with each others.. By adopting the routing protocols within the MANET
The Mobile Ad hoc NETwork (MANET) is a kind of network without the existence of infrastructure. The mobile nodes (MNs) in the MANET can exchange their data packets directly with each others.. By adopting the routing protocols within the MANET
Externí odkaz:
http://ndltd.ncl.edu.tw/handle/60072304388003399327
Publikováno v:
2019 10th International Conference on Power Electronics and ECCE Asia (ICPE 2019 - ECCE Asia).
Rotary inductive power transfer (RIPT) systems have the advantages in wireless power transfer capability, unlimited angular position operation, and flexible light-emitting diode (LED) lighting application. Therefore, this study discusses the performa
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d1be1b15330a1e00c66f0b99958d432a
https://doi.org/10.23919/icpe2019-ecceasia42246.2019.8797070
https://doi.org/10.23919/icpe2019-ecceasia42246.2019.8797070
Publikováno v:
IEEE Design & Test of Computers. 24:154-162
For functional verification, software simulation provides full controllability and observability, whereas hardware emulation offers speed. This article describes a new platform that leverages the advantages of both. This platform implements an effici
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3e430292d0e2dc3e8ca3bfd63beb58ee
https://doi.org/10.1109/mdt.2007.46
https://doi.org/10.1109/mdt.2007.46
Publikováno v:
2007 IEEE International Behavioral Modeling and Simulation Workshop.
In this paper, an efficient bottom-up extraction approach is proposed to build accurate behavioral model for the switched-capacitor (SC) delta-sigma (DeltaSigma) modulator. In the special extraction mode, we can use several specific patterns to obtai
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9c761c2961500e4ad678b9fa23f7e047
https://doi.org/10.1109/bmas.2007.4437518
https://doi.org/10.1109/bmas.2007.4437518
Publikováno v:
2007 IEEE International Behavioral Modeling & Simulation Workshop; 2007, p17-21, 5p