Zobrazeno 1 - 10
of 28
pro vyhledávání: '"Wei Jen Hsieh"'
Autor:
Wei Jen Hsieh, 謝維仁
89
in the experiment,our purpose was to grow copper thin films using plasma immersion ion implantation and electroless copper systems.First,we implanted catalyst layer, such as Pd,Cu etc, using plasma immersion ion implantation in large areas un
in the experiment,our purpose was to grow copper thin films using plasma immersion ion implantation and electroless copper systems.First,we implanted catalyst layer, such as Pd,Cu etc, using plasma immersion ion implantation in large areas un
Externí odkaz:
http://ndltd.ncl.edu.tw/handle/18230345920435302614
Autor:
Kuo-Hao Lee1 klee@bloomu.edu, Wei-Jen Hsieh2 whsieh@bloomu.edu
Publikováno v:
Proceedings for the Northeast Region Decision Sciences Institute (NEDSI). 2013, p458-488. 31p. 8 Charts.
Autor:
Kuo-Hao Lee1 klee@bloomu.edu, Wei-Jen Hsieh2 whsieh@bloomu.edu
Publikováno v:
Proceedings for the Northeast Region Decision Sciences Institute (NEDSI). 2013, p415-457. 43p. 18 Charts, 15 Graphs.
Autor:
Yu-Hsiang Yang, Wei-Jen Hsieh, Li-Shin Cheng, Meng-Wen Huang, Chun-Chun Lin, Jui-Yun Jao, Han C. Shih, Fuh-Sheng Shieu
Publikováno v:
Applied Surface Science. 261:21-24
Cr doped diamond-like carbon (DLC:Cr) film was synthesized in various flow rates of C 2 H 2 /Ar under a substrate voltage of −50 V at 500 °C by a filtered cathodic vacuum arc plasma. This work has found that the structure of the films was correlat
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2fa9d127a637f629345020ad81f6c681
https://doi.org/10.1016/j.apsusc.2012.07.031
https://doi.org/10.1016/j.apsusc.2012.07.031
Publikováno v:
Journal of Physics D: Applied Physics. 40:2787-2791
Nanostructured tin oxides have been synthesized in the form of nano-pins using SnCl2 ? 2H2O as precursors in a short period of 2.5?min by microwave plasma enhanced CVD. The resulting nano-pins have square cross sections of 50?60?nm at the pin head, 1
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ac07a69b56dbae8a9b5aa5562b9ac195
https://doi.org/10.1088/0022-3727/40/9/018
https://doi.org/10.1088/0022-3727/40/9/018
Publikováno v:
Surface and Coatings Technology. 200:5052-5057
Deposition of chromium carbides films using a 90° bend filtered cathodic vacuum arc (FCVA) system is highly promising for industrial applications, because chromium carbide films uncontaminated by macroparticles exhibit excellent characteristics. Chr
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5b072a71fd820916d1535c3733f7d045
https://doi.org/10.1016/j.surfcoat.2005.05.027
https://doi.org/10.1016/j.surfcoat.2005.05.027
Publikováno v:
Surface and Coatings Technology. 200:3175-3178
Amorphous carbon nitride (a-C:N) films were deposited on silicon using a 90°-bend filtered cathode vacuum arc system. The optical properties of a-C:N films were studied using spectroscopic ellipsometry and cathodoluminescence. The results are discus
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b124d728e51876af28008425c00c7ba7
https://doi.org/10.1016/j.surfcoat.2005.07.038
https://doi.org/10.1016/j.surfcoat.2005.07.038
Publikováno v:
Carbon. 44:107-112
The fluorine doped amorphous carbon nanoparticles (a-C:F NPs) films with sizes 50–100 nm were deposited on polyethylene terephthalate in an atmosphere of CF4 by a 90°-bend magnetic filtered cathodic arc plasma system. The surface morphology of a-C
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6353bd3871ef035a76bddd903f55e518
https://doi.org/10.1016/j.carbon.2005.07.009
https://doi.org/10.1016/j.carbon.2005.07.009
Autor:
Yee-Shyi Chang, Ku-Ling Chang, Han C. Shih, Wei-Jen Hsieh, Chih-Yuan Wang, Jyh-Wei Lee, Chun-Chun Lin
Publikováno v:
Surface and Coatings Technology. 200:2679-2685
High quality Cr 3 C 2 thin films on the AISI D2 steel and on the silicon wafer using a Cr target (99.95%) and an Ar/C 2 H 2 gas mixture were studied. A 90°-bend magnetic filtered cathodic vacuum arc (FCVA) system has been employed to eliminate the m
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::beee7a075118d7c8d4024fb40eb2663f
https://doi.org/10.1016/j.surfcoat.2005.01.029
https://doi.org/10.1016/j.surfcoat.2005.01.029
Publikováno v:
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. 237:470-476
Metal-plasma ion implanter has been used in this research to insert Cu ions as self-catalyst into the sub-surface of the TaN/FSG/Si assembly for electroless-plated Cu film. Cu ions were first implanted using two dosages of 5.0 x 10 1 6 and 10 × 10 1
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::57b214b04d0353c274d5f277ff5b7e47
https://doi.org/10.1016/j.nimb.2005.05.017
https://doi.org/10.1016/j.nimb.2005.05.017