Zobrazeno 1 - 10
of 22
pro vyhledávání: '"Wayne J. Dunstan"'
Autor:
Daniel J. Riggs, Rick Sandstrom, Slava Rokitski, Igor V. Fomenkov, Yezheng Tao, Rob Rafac, Christian Wagner, Norbert R. Bowering, Wayne J. Dunstan, Georgiy O. Vaschenko, Noreen Harned, Ron Kool, Hans Meiling, Alexander Schafgans, Alberto Pirati, Matthew J. Graham, Nigel R. Farrar, Daniel J. W. Brown, David C. Brandt, Michael Purvis, Alex I. Ershov
Publikováno v:
SPIE Proceedings.
This paper describes the development and evolution of the critical architecture for a laser-produced-plasma (LPP) extreme-ultraviolet (EUV) source for advanced lithography applications in high volume manufacturing (HVM). In this paper we discuss the
Autor:
Wayne J. Dunstan, Robert R. Bitmead
Publikováno v:
IFAC Proceedings Volumes. 36:1831-1836
The distribution of parameter estimates from a finite data record is of concern for assessing the confidence in the resulting estimate. Our interest is in the development of nonlinear dynamical models from experimental data and the problem which aris
Autor:
Robert R. Bitmead, Wayne J. Dunstan
Publikováno v:
IFAC Proceedings Volumes. 36:651-656
System identification of the forward path of a linear unity feedback system, which is almost unstable, is considered through the application of a periodic multiplicative reference signal. Motivation for this problem comes from the need to identify th
Autor:
Robert R. Bitmead, Wayne J. Dunstan
Publikováno v:
IFAC Proceedings Volumes. 35:73-78
This paper deals with defining measures of model closeness and establishing quantitative confidence bounds on nominal models. Confidence in a model is an indication of how uniquely identifiable the best fitting parameter values are from the data. The
Publikováno v:
Control Engineering Practice. 9:1301-1317
Tools for fitting low-complexity nonlinear models based on experimental data are examined through the example problem of finding a reduced-order model suitable for control of a combustion instability operating in a limit cycle. This proceeds in four
Publikováno v:
International Journal of Control. 74:1796-1806
This paper deals with the analysis of a set of measurements collected on a lean premixed combustion process operating in a limit cycle. Due to the fact that the data are collected in closed-loop and the system has no external excitation, the identifi
Publikováno v:
IFAC Proceedings Volumes. 33:651-656
This paper deals with nonlinear system identification of a set of measurements collected on a lean premixed combustion process operating in a limit cycle. Due to the fact that the data are collected in closed-loop and the system has no external excit
Autor:
Jonathan Grava, Yezheng Tao, Bruno La Fontaine, Daniel J. W. Brown, Robert A. Bergstedt, Chirag Rajyaguru, Nigel R. Farrar, Kevin Zhang, Robert N. Jacques, Alex I. Ershov, Norbert R. Bowering, Silvia De Dea, Toshi Ishihara, Georgiy O. Vaschenko, David W. Myers, David R. Evans, Christopher J. Wittak, David C. Brandt, Imtiaz Ahmad, Alexander Schafgans, Richard L. Sandstrom, Vladimir B. Fleurov, Palash P. Das, Igor V. Fomenkov, Robert J. Rafac, Shailendra N. Srivastava, Peter I. Porshnev, Spencer Rich, Peter Baumgart, Rod D. Simmons, Tedsuja Ishikawa, Wayne J. Dunstan, Kay Hoffmann
Publikováno v:
Extreme Ultraviolet (EUV) Lithography IV.
Laser produced plasma (LPP) systems have been developed as the primary approach for use in EUV scanner light sources for optical imaging of circuit features at 20nm nodes and beyond. This paper provides a review of development progress and productiza
Autor:
David W. Myers, Richard L. Sandstrom, Alex I. Ershov, Tao Yezheng, Daniel J. Riggs, Robert A. Bergstedt, Wayne J. Dunstan, Alexander Schafgans, Daniel J. W. Brown, Georgiy O. Vaschenko, Robert J. Rafac, Palash P. Das, Igor V. Fomenkov
Publikováno v:
CLEO: 2013.
Laser produced plasma (LPP) systems are the leading approach for extreme-ultra-violet (EUV) lithography of circuit features at sub-20nm nodes. This paper reviews technology and development progress for high-power sources optimized for EUV lithography
Autor:
Michael J. Lercel, Chirag Rajyaguru, Richard L. Sandstrom, Bruno La Fontaine, David W. Myers, Kevin Zhang, Toshi Ishihara, Silvia De Dea, Georgiy O. Vaschenko, Norbert R. Bowering, Robert N. Jacques, Jonathan Grava, Alex I. Ershov, Daniel J. W. Brown, Robert A. Bergstedt, Christian J. Wittak, Imtiaz Ahmad, Michael R. Woolston, Alexander N. Bykanov, Vladimir B. Fleurov, David C. Brandt, Peter I. Porshnev, Alexander Schafgans, Shailendra N. Srivastava, Robert J. Rafac, Rod D. Simmons, Wayne J. Dunstan, Palash P. Das, Igor V. Fomenkov, Peter Baumgart, Yezheng Tao
Publikováno v:
SPIE Proceedings.
Laser produced plasma (LPP) systems have been developed as the primary approach for the EUV scanner light source for optical imaging of circuit features at sub-22nm and beyond nodes on the ITRS roadmap. This paper provides a review of development pro