Zobrazeno 1 - 5
of 5
pro vyhledávání: '"Waut Drent"'
Autor:
Yiren Zhang, Toru Umeda, Hirokazu Sakakibara, Sheik Ansar Usman Ibrahim, Atsushi Sakamoto, Amarnauth Singh, Robert Shick, Karl Skjonnemand, Philippe Foubert, Waut Drent
Publikováno v:
Advances in Patterning Materials and Processes XL.
Autor:
Toru Umeda, Lucia D'Urzo, Takehito Mizuno, Amarnauth Singh, Rajan Beera, Philippe Foubert, Atsushi Hattori, Waut Drent
Publikováno v:
2021 China Semiconductor Technology International Conference (CSTIC).
To comply with defect specification, Extreme Ultra-Violet (EUV) lithography necessitates performance improvement for both bulk and point-of-use (POU) filters. In this study, the data represent novel polyethylene and nylon filters for a variety of bul
Autor:
Takehito Mizuno, Philippe Foubert, Rajan Beera, Lucia D'Urzo, Toru Umeda, Amarnauth Singh, Waut Drent, Atsushi Hattori
Publikováno v:
Advances in Patterning Materials and Processes XXXVIII.
Extreme Ultra-Violet (EUV) lithography is pushing material suppliers to provide the cleanest possible products for tight quality standards. The emphasis on minimizing residual particles, metals, and organics coming from materials and equipment contin
Autor:
Philippe Foubert, Toru Umeda, Rao Varanasi, Atsushi Hattori, Waut Drent, Jelle Vandereyken, Lucia D'Urzo, Takehito Mizuno, Rajan Beera, Amarnauth Singh
Publikováno v:
Advances in Patterning Materials and Processes XXXVII.
The availability of EUV lithography is the mainstream for resolving critical dimension of the advanced technology nodes, currently in the range of 18nm and below [1]. The first insertion of EUVL into manufacturing utilizes chemically amplified resist
Autor:
Tanaka Yuji, Nakayama Chisayo, Jelle Vandereyken, Waut Drent, Masahiko Harumoto, Charles Pieczulewski, Harold Stokes, Masaya Asai
Publikováno v:
Advances in Patterning Materials and Processes XXXV.
Currently, there are many developments in the field of advanced lithography that are helping to move it towards increased HVM feasibility1,2,3,4. Targeted improvements in hardware design for advanced lithography are of interest to our group specifica