Zobrazeno 1 - 5
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pro vyhledávání: '"Wanpo Liu"'
Publikováno v:
Physica Scripta. 41:777-779
A lithography beam line, as the first of possibly six or more, has been installed in the Hefei Synchrotron Radiation Laboratory (HESYRL). A scanning mirror is used to cut off shorter wavelengths and to expand exposure dimensions vertically. The scann
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5fa66fb401f3bd25d1ac042fd514f7e6
https://doi.org/10.1088/0031-8949/41/6/011
https://doi.org/10.1088/0031-8949/41/6/011
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 8:1524
An x‐ray lithography beamline, the first of six planned at Hefei National Synchrotron Radiation Laboratory (HESYRL), was completed and installed in the summer of 1989. A scanning mirror, the key optical component of the beamline, is used to cut off
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6f6718c3afcd30248f4d972c05d4112a
https://doi.org/10.1116/1.585109
https://doi.org/10.1116/1.585109
Publikováno v:
Review of Scientific Instruments. 60:2148-2149
The lithography beamline design of Hefei National Synchrotron Radiation Laboratory is presented. A scanning mirror is used to cut off short wavelength radiation and to expand the vertical exposure dimension to 50 mm. A thin beryllium window is instal
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2fcf81e3dd3cf9239ac9943610640aac
https://doi.org/10.1063/1.1140805
https://doi.org/10.1063/1.1140805
Autor:
Qian, Shinan, Li, Guihe, Liu, Zewen, Chen, Qianhong, Jiang, Dikui, Liu, Wanpo, Kan, Ya, Su, Yonggang
Publikováno v:
Journal of Vacuum Science & Technology: Part B-Microelectronics Processing & Phenomena; 1990, Vol. 8 Issue 6, p1524-1528, 5p
Publikováno v:
Physica Scripta; 1990, Vol. 41 Issue 6, p1-1, 1p