Zobrazeno 1 - 2
of 2
pro vyhledávání: '"Wang-Yi Lee"'
Publikováno v:
2022 International Symposium on VLSI Technology, Systems and Applications (VLSI-TSA).
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::07c8b014921108cfcc42bc892e6ba243
https://doi.org/10.1109/vlsi-tsa54299.2022.9770983
https://doi.org/10.1109/vlsi-tsa54299.2022.9770983
Publikováno v:
2020 International Symposium on VLSI Technology, Systems and Applications (VLSI-TSA).
In this study, a Vertical Via RRAM fully compatible to cutting-edge FinFET CMOS logic process has been demonstrated. These Vertical Via RRAM devices are formed by the stacked nanometer via and metal in the Cu BEOL CMOS logic process. Between the two
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::51c2515c1e7b6fcb6d14285c2a300aaf
https://doi.org/10.1109/vlsi-tsa48913.2020.9203679
https://doi.org/10.1109/vlsi-tsa48913.2020.9203679