Zobrazeno 1 - 1
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pro vyhledávání: '"Wan-Hao Lai"'
Publikováno v:
Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena. 36:03F132
Quantitative determination of metal impurities becomes increasingly crucial for the semiconductor industry as integrated circuit critical dimensions continue to shrink. Time-of-flight secondary ion mass spectrometry (TOF SIMS) has been widely used fo
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c1fe05a7822523141ef550c4cae8defc
https://doi.org/10.1116/1.5019679
https://doi.org/10.1116/1.5019679
