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Autor:
Pernau, T., Fuchs, J.-U., Nguyen, V.X., Nickel, A., Walk, U., Jooß, W., Hsu, K., Chen, J., Wiebecke, S., Wu, H.H., Hung, K.-H., Lin, K.C., Huang, W.K.W.
32nd European Photovoltaic Solar Energy Conference and Exhibition; 374-377
Standard direct plasma (40 kHz) batch-type PECVD machines can be equipped with TMA (Trimethylaluminium) and N2O supply to enable aluminium oxide (AlOx) / silicon nitride
Standard direct plasma (40 kHz) batch-type PECVD machines can be equipped with TMA (Trimethylaluminium) and N2O supply to enable aluminium oxide (AlOx) / silicon nitride
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d7cb786b90377d46b34973fa77e0c7ea
