Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Waleri Imgrunt"'
Autor:
Mikhail Ivanenko, Denis G. Pikhulya, Waleri Imgrunt, Lisa Kleinschmidt, Vitalij Lissotschenko, A. Krasnaberski, Yuri V. Miklyaev
Publikováno v:
SPIE Proceedings.
Diffractive optical elements (DOEs) are of rising importance for many industrial laser applications, especially for laser beam shaping and laser beam splitting. Typically, such applications require high damage threshold of the diffractive optical ele
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b35b7df370b852b25fac21a204fe83d9
https://doi.org/10.1117/12.908784
https://doi.org/10.1117/12.908784
Autor:
Mikhail Ivanenko, A. Krasnaberski, Lutz Aschke, Alexei Mikhailov, Vitalij Lissotschenko, Waleri Imgrunt, Yu. V. Miklyaev
Publikováno v:
SPIE Proceedings.
Diffractive optical elements (DOE) play an important role for laser beam shaping in industry, for example in lithography or parallel laser material processing. Typically such applications require high damage threshold and low background illumination
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9caae36de39132748905692c4fd5153f
https://doi.org/10.1117/12.874642
https://doi.org/10.1117/12.874642
Autor:
Maxim V. Bolshakov, Waleri Imgrunt, Lutz Aschke, Victor A. Soifer, Vladimir S. Pavelyev, Yuri V. Miklyaev, Denis G. Kachalov, Vitaly Lissotschenko
Optical lithography with its 193nm technology is pushed to reach and shift its limits even further. There is strong demand on innovations in illumination part of exposure tools. Current illumination systems consisting of diffractive and refractive op
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::f838611a82873ec36044bd5dea6b2808
http://dspace.susu.ru/handle/0001.74/20499
http://dspace.susu.ru/handle/0001.74/20499
