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pro vyhledávání: '"W.T. Lindley"'
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Autor:
G. A. Lincoln, B.A. Vojak, W. J. Piacentini, L. J. Mahoney, K. B. Nichols, W.T. Lindley, Michael W. Geis, N. N. Efremow, A. Chu
Publikováno v:
Journal of Vacuum Science and Technology. 20:786-789
We have developed a new anisotropic dry etching technique for GaAs that results in etched surfaces of sufficient quality for many device applications. In this technique a chemically reactive gas from a jet and an ion beam from a Kaufman ion source ar
Autor:
W.T. Lindley, G.A. Lincoln, N. P. Economou, Carl O. Bozler, R.W. McClelland, R.A. Murphy, G. D. Johnson, G.D. Alley, D.C. Flanders, Jack P. Salerno, B. A. Vojak, K. B. Nichols
Publikováno v:
Journal of Applied Physics. 54:3554-3560
Transmission electron microscopy has been employed to characterize GaAs permeable base transistor structures. Submicrometer‐period tungsten base gratings fabricated on GaAs substrates by using either liftoff or etching techniques have been studied.
Publikováno v:
Solid-State Electronics. 16:529-534
N-p junction photodiodes in PbS have been fabricated using Sb+ ion implantation to create the n-type layer. At 300°K, 15-mil-square diodes have shown typical zero-bias resistances of 200 Ω corresponding to a resistance-area product of 0.28 Ω-cm2.
Publikováno v:
Solid-State Electronics. 13:755-758
We have observed that proton bombardment can be used to create high resistivity layers in p -ZnTe and have used this technique to fabricate avalanching MIS electroluminescent diodes. The breakdown voltages for these diodes ranged from approximately 6
Publikováno v:
Solid-State Electronics. 12:209-214
Proton bombardment has been used to convert both p- and n-type GaAs into high resistivity material. It will be shown that this technique is useful for isolating junction devices and fabricating arrays. The average carrier concentration in the bombard
Publikováno v:
Solid-State Electronics. 15:403-407
N-p junction photovoltaic detectors in Pb0.88Sn0.12Te and laser diodes in both PbTe and Pb0.88Sn0.12Te fabricated using proton bombardment to create the n-type layer are reported. Zero-bias resistance area products as high as 1.4 Ω-cm2 at 77°K and
Publikováno v:
IEEE Electron Device Letters. 7:41-43
Three-dimensional (3-D) structures have been fabricated incorporating power bipolar transistors in a Si substrate and metal-oxide-semiconductor field-effect transistors (MOSFET's) in an overlying silicon-on-insulator (SOI) film that was zone-melting
Publikováno v:
IEEE Transactions on Electron Devices. 32:2547-2548
Autor:
B.E. Burke, W.T. Lindley
Publikováno v:
Electronics Letters. 13:521
A c.c.d. transversal-filter structure is described which is capable of processing signals at high data rates. The tap weights can be programmed as digital words. A 32-stage prototype device has been tested at clock rates up to 20 MHz; operation at ev