Zobrazeno 1 - 10
of 193
pro vyhledávání: '"W.J. Goedheer"'
Publikováno v:
physica status solidi (a). 213:1826-1830
Various plasma process parameters such as coupled power, process pressure (p), gas flow, and source gas ratios (SiH4:H2) play crucial roles in determining the size and crystallinity of the synthesized Si nanoparticles (NPs). One of the less studied p
Publikováno v:
physica status solidi (a). 213:1680-1685
We studied ion bombardment during amorphous silicon layer deposition for hydrogen dilutions 5 to 59 with mass resolved IED measurements and simulations. The trends in the peak position of H2+ and SiHy+ IEDs with increasing hydrogen dilution show good
Publikováno v:
Journal of Nuclear Materials, 438, Supplement, S643-S646
Journal of Nuclear Materials
Journal of Nuclear Materials, v.438, S643-S646 (2013)
Journal of Nuclear Materials
Journal of Nuclear Materials, v.438, S643-S646 (2013)
The B2.5-Eunomia code is used to simulate the plasma and neutral species in and around a Pilot-PSI plasma beam. B2.5, part of the SOLPS5.0 code package, is a multi-fluid plasma code for the scrape-off layer. Eunomia is a newly developed non-linear Mo
Publikováno v:
Journal of Applied Physics, 120, 053304
Journal of Applied Physics, 120(5):053304. American Institute of Physics
Journal of Applied Physics, 120(5):053304. American Institute of Physics
We investigated chemical sputtering of silicon films by Hy + ions (with y being 2 and 3) in an asymmetric VHF Plasma Enhanced Chemical Vapor Deposition (PECVD) discharge in detail. In experiments with discharges created with pure H2 inlet flows, we o
Autor:
V. M. Krivtsun, Dmitry Astakhov, J Job Beckers, Christopher James Lee, Frederik Bijkerk, W.J. Goedheer, R. M. van der Horst, EA Osorio, V. V. Ivanov, Konstantin N Koshelev, Dmitry Lopaev
Publikováno v:
Journal of Physics D: Applied Physics, 49(29):295204. Institute of Physics
Journal of Physics D: Applied Physics, 49, 295204
Journal of physics D: applied physics, 49(29):295204. IOP Publishing Ltd.
Journal of Physics D: Applied Physics, 49, 295204
Journal of physics D: applied physics, 49(29):295204. IOP Publishing Ltd.
We used numerical modeling to study the evolution of EUV-induced plasmas in argon and hydrogen. The results of simulations were compared to the electron densities measured by microwave cavity resonance spectroscopy. It was found that the measured ele
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::5337941b975e5780b4d314ba42a213e0
Autor:
Waj Wouter Vijvers, M.A. van den Berg, V. Philipps, B. Schweer, R.S. Al, W Melissen, A.W. Kleyn, A.R. Lof, P.H.M. Smeets, W.R. Koppers, R. Koch, Juergen Rapp, V. Massaut, J. Scholten, M.F. Graswinckel, S. Kraus, P.A. Zeijlmans van Emmichoven, S. Brons, Arkadi Kreter, G. De Temmerman, Detlev Reiter, J. Schuurmans, U. Samm, H. Reimer, H.J.N. van Eck, Rje Roger Jaspers, G.J. van Rooij, W.J. Goedheer, T. van der Grift, DC Daan Schram, B. Unterberg, M. J. van de Pol, H.J. van der Meiden, JJ Jakub Zielinski, L. Scheibl, O.G. Kruyt, I. Uytdenhouwen
Publikováno v:
Fusion Engineering and Design, 86, 1797-1800
Fusion Engineering and Design, 86(9-11), 1797-1800. Elsevier
Fusion Engineering and Design, 86(9-11), 1797-1800. Elsevier
New linear plasma devices are currently being constructed or planned in the Trilateral Euregio Cluster (TEC) to meet the challenges with respect to plasma surface interactions in DEMO and ITER: i) MAGNUM-PSI (FOM), a high particle and power flux devi
Autor:
O.G. Kruyt, V. Philipps, P.H.M. Smeets, J. Scholten, M.F. Graswinckel, R.S. Al, U. Samm, Juergen Rapp, W.A.J. Vijvers, R. Koch, S. Brons, van der T. Grift, A.W. Kleyn, van den M.A. Berg, de B. Groot, van de M.J. Pol, W Melissen, DC Daan Schram, W.R. Koppers, van G.J. Rooij, N.J. Lopes Cardozo, W.J. Goedheer, van der H.J. Meiden, van H.J.N. Eck, B. Schweer, Richard Engeln
Publikováno v:
Fusion Engineering and Design, 85(7-9), 1455-1459. Elsevier
Fusion Engineering and Design, 85, 1455-1459
Fusion Engineering and Design, 85, 1455-1459
The FOM-Institute for Plasma Physics Rijnhuizen is constructing Magnum-PSI; a magnetized (3 T), steady-state, large area (80 cm2) high-flux (up to 1 024 H+ ions m-2 s-1) plasma generator. Magnum-PSI will be a highly accessible laboratory experiment i
Publikováno v:
STARTPAGE=38;ENDPAGE=43;TITLE=None
In order to increase industrial viability and to find niche markets, high deposition rate and low temperature depositions compared to standard deposition conditions are two recent trends in research areas concerning thin film silicon. In situ diagnos
Publikováno v:
Plasma Science & Technology, 10, 162-169
Results from simulations of plasma and neutrals under conditions predictively characterizing the detached plasma regime in the linear machine MAGNUM-PSI are presented. The relaxation of the vibrationally excited hydrogen molecules is investigated in
Autor:
G.J. van Rooij, Rah Richard Engeln, A.W. Kleyn, J. Westerhout, P.R. Prins, R.S. Al, N.J. Lopes Cardozo, W.J. Goedheer, B. de Groot, O.G. Kruijt, DC Daan Schram, H. J. v. d. Meiden, P.H.M. Smeets, V.P. Veremiyenko, W.A.J. Vijvers
Publikováno v:
Fusion Engineering and Design, 82(15-24), 1861-1865. Elsevier
Pilot-PSI produces hydrogen plasma with a cascaded arc. It is demonstrated that the output electron density reaches 4 × 1021 m-3 by pushing the input power to 45 kW. Increasing the diameter of the discharge channel (studied from 4 to 7 mm) does not