Zobrazeno 1 - 10
of 709
pro vyhledávání: '"W.I. Milne"'
Autor:
F.J. Clough, W.I. Milne
Publikováno v:
Solid State Phenomena. :983-1022
Autor:
S. Iacobucci, M. Fratini, A. Rizzo, F. Scarinci, Y. Zhang, M. Mann, C. Li, W.I. Milne, M.M. Gomati, S. Lagomarsino, G. Stefani
Publikováno v:
Applied physics letters 100 (2012).
info:cnr-pdr/source/autori:S. Iacobucci, M. Fratini, A. Rizzo, F. Scarinci, Y. Zhang, M. Mann; C. Li, W.I. Milne, M.M. Gomati, S. Lagomarsino, G. Stefani/titolo:"Angular distribution of field emitted electrons from vertically aligned carbon nanotube arrays"/doi:/rivista:Applied physics letters/anno:2012/pagina_da:/pagina_a:/intervallo_pagine:/volume:100
info:cnr-pdr/source/autori:S. Iacobucci, M. Fratini, A. Rizzo, F. Scarinci, Y. Zhang, M. Mann; C. Li, W.I. Milne, M.M. Gomati, S. Lagomarsino, G. Stefani/titolo:"Angular distribution of field emitted electrons from vertically aligned carbon nanotube arrays"/doi:/rivista:Applied physics letters/anno:2012/pagina_da:/pagina_a:/intervallo_pagine:/volume:100
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=cnr_________::752b6222d9e9911d774d2fefe443b7c5
http://www.cnr.it/prodotto/i/202280
http://www.cnr.it/prodotto/i/202280
Autor:
S.Z. Ali, P.K. Guha, C.C.C. Lee, F. Udrea, W.I. Milne, T. Iwaki, J. Covington, J. W. Gardner, S. Maeng, J. Park
Publikováno v:
2006 5th IEEE Conference on Sensors.
Here we present for the first time, the design, fabrication and characterization of novel high temperature SOI micro-hotplates employing tungsten resistive heaters. Tungsten has a high operating temperature, good mechanical strength, and could be use
Akademický článek
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Autor:
null Seung-Beck Lee, A.-S. The, K.B.K. Teo, D.G. Hasko, H. Ahmed, W.I. Milne, G.A.J. Amaratunga
Publikováno v:
4th IEEE International Conference on Vacuum Electronics, 2003.
Fabrication and operation of a carbon nanotube lateral field emission device is reported. Compared to vertical field emitters using carbon nanotube cathodes, it has less alignment problems since the anode is fabricated at the same time as the cathode
Publikováno v:
ICSE '96. 1996 IEEE International Conference on Semiconductor Electronics. Proceedings.
Hydrogenated amorphous silicon carbide films (a-SiC:H) were deposited using the electron cyclotron resonance chemical vapour deposition (ECR-CVD) technique from a mixture of methane, silane and hydrogen, with diborane as the doping gas. The effect of
Publikováno v:
ICSE '96. 1996 IEEE International Conference on Semiconductor Electronics. Proceedings.
The deposition of hydrogenated amorphous silicon carbide (a-SiC:H) films from a mixture of silane, acetylene and hydrogen gas using the electron cyclotron resonance chemical vapour deposition (ECR-CVD) process is reported. The variation of the deposi