Zobrazeno 1 - 7
of 7
pro vyhledávání: '"W. Thomas Leach"'
Publikováno v:
International Journal of Pharmaceutics. 423:264-280
Agitation of small amounts of liquid is performed routinely in biopharmaceutical process, formulation, and packaging development. Protein degradation commonly results from agitation, but the specific stress responsible or degradation mechanism is usu
Encapsulation of protein nanoparticles into uniform-sized microspheres formed in a spinning oil film
Autor:
Kwon Taek Lim, Eun Jeong Park, Dale T. Simpson, Zhongshui Yu, W. Thomas Leach, Keith P. Johnston, Tibisay N. Val, Robert O. Williams
Publikováno v:
AAPS PharmSciTech. 6:E605-E617
A new spinning oil film (SOF) solid-in-oil-in-oil emulsion process was developed to produce uniform-sized protein-loaded biodegradable microspheres. A thin SOF on a cylindrical rotor was used to shear droplets from a nozzle tip to control droplet siz
Autor:
Keith P. Johnston, Robert O. Williams, Tibisay N. Val, Zhongshui Yu, Efemona C. Anuta, Dale T. Simpson, W. Thomas Leach
Publikováno v:
Journal of Pharmaceutical Sciences. 94:56-69
Stable protein nanostructured particles, produced by spray freezing into liquid (SFL) nitrogen, were encapsulated uniformly into microspheres to reduce the burst release over the first 24 h. The denaturation and aggregation of these bovine serum albu
Publikováno v:
Journal of Applied Physics. 92:4695-4698
High-density (>1×1012 cm−2) Si nanoparticles have been successfully grown on Si3N4 and SiO2 thin films by hot-wire chemical vapor deposition (HW-CVD) using disilane, in which Si atoms are generated on a heated tungsten filament and, after desorbin
Publikováno v:
Journal of Crystal Growth. 243:30-40
Silicon nanoparticles are grown via ultra high vacuum chemical vapor deposition (UHV-CVD) on SiO 2 and Si 3 N 4 covered Si(1 0 0) substrates using disilane. Temperature programmed desorption spectra demonstrate the presence of H 2 and SiO desorption
Publikováno v:
Journal of Crystal Growth. 240:415-422
Deposition of sub-monolayer silicon on SiO 2 /Si(1 0 0) greatly facilitates nucleation in subsequent thermal chemical vapor deposition (CVD) of silicon nanoparticles. Sub-monolayer seeding is accomplished using silicon atoms generated via disilane de
Publikováno v:
MRS Proceedings. 704
A non-thermal method to facilitate nucleation for subsequent thermal chemical vapor deposition of Si nanoparticles on SiO2/Si(001) with high density and uniform size is demonstrated. Submonolayers of Si adatoms are predeposited on SiO2/Si(001) substr