Zobrazeno 1 - 10
of 36
pro vyhledávání: '"W. Proscia"'
Publikováno v:
Chemistry of Materials. 11:3490-3496
The atmospheric pressure chemical vapor deposition of titanium aluminum nitride films was accomplished using a three-precursor system comprised of titanium tetrachloride, tert-butylamine, and trimethylaluminum at a substrate temperature of 600 °C. S
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6144e1abe4d1f97b0bc7fe13142fb243
https://doi.org/10.1021/cm990157u
https://doi.org/10.1021/cm990157u
Publikováno v:
Inorganic Chemistry. 33:1227-1229
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4df9200c3201eb55dc34f3cc099a8db7
https://doi.org/10.1021/ic00084a043
https://doi.org/10.1021/ic00084a043
Publikováno v:
Chemistry of Materials. 4:1144-1146
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::57f168f14d904d5afa47e690b9864fa5
https://doi.org/10.1021/cm00024a007
https://doi.org/10.1021/cm00024a007
Autor:
T. Suren Lewkebandara, Philip H. Sheridan, Mary Jane Heeg, James W. Proscia, Charles H. Winter
Publikováno v:
Journal of the American Chemical Society. 114:1095-1097
Monomeric titanium and zirconium complexes with multiple bonds to oxygen, sulfur, and nitrogen have attracted considerable attention due to their novel structural features and interesting reactivity. Recently, we have initiated a research program tha
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c985a4056463474dfa726cbf24be9a19
https://doi.org/10.1021/ja00029a053
https://doi.org/10.1021/ja00029a053
Autor:
W. Proscia, J. DeLaat, J. B. McVey, Kevin J. Breisacher, J. Lovett, Brian E. Wake, J. R. Hibshman, T. J. Rosfjord, M. Ondas, Jeffrey M. Cohen
Publikováno v:
Volume 2: Coal, Biomass and Alternative Fuels; Combustion and Fuels; Oil and Gas Applications; Cycle Innovations.
Combustion instabilities in gas turbine engines are most frequently encountered during the late phases of engine development, at which point they are difficult and expensive to fix. The ability to replicate an engine-traceable combustion instability
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2fd8acba8ff22a6f40e8d2fc9aa73ab4
https://doi.org/10.1115/2000-gt-0093
https://doi.org/10.1115/2000-gt-0093
Publikováno v:
MRS Proceedings. 363
Atmospheric Pressure Chemical Vapor Deposition (APCVD) and powder spray pyrolysis are both pyrolytic thin film deposition techniques that are used to coat glass with thin films at atmospheric pressure. In the present study, the fluid dynamics of each
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::38f0834ae2e15cc8e64a0ec075738cc2
https://doi.org/10.1557/proc-363-51
https://doi.org/10.1557/proc-363-51
Autor:
Joan Rodriguez, James W. Proscia, Narayan Malani, Keith B. Williams, Ogie Stewart, Gene P. Reck
Publikováno v:
MRS Proceedings. 335
Vanadium oxide thin films were grown on glass substrates by atmospheric pressure chemical vapor deposition (APCVD) from the reaction of vanadium(IV) chloride with isopropanol and t-butanol. Films were deposited in the temperature range 250 to 450°C.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::12a85a9c7256a53c4267edb7b3bb872d
https://doi.org/10.1557/proc-335-329
https://doi.org/10.1557/proc-335-329
Publikováno v:
MRS Proceedings. 327
Herein we report our efforts to prepare new precursors to niobium nitride (NbN) and tantalum nitride (TAN, Ta3N5) thin films. Treatment of MC15 (M = Nb, Ta) with tertbutylamine in benzene solvent affords complexes of the formula [MCI2 (NtBu)(NHtBu)(N
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::44cb9a1ced94944aedcf9047f49b82cb
https://doi.org/10.1557/proc-327-103
https://doi.org/10.1557/proc-327-103
Publikováno v:
MRS Proceedings. 324
The premixability of reagents used in chemical vapor deposition reactors is important to insure that gas feed lines and nozzles do not become clogged with particulates during operation. Even if reactants are to be kept separate until introduced into
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::90590f877510aa4f98a58701c8366c75
https://doi.org/10.1557/proc-324-133
https://doi.org/10.1557/proc-324-133