Zobrazeno 1 - 3
of 3
pro vyhledávání: '"W. Piscitello"'
Publikováno v:
2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 (Cat. No.00EX432).
The Varian VIISta 80 is a single-wafer high-current implanter, which uses a ribbon beam and a single-direction mechanical scan for implantation. The placement of the wafers on an electrostatic platen, and the absence of end station parts in the vicin
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::863f937796cae115f823842a85ceac13
https://doi.org/10.1109/iit.2000.924253
https://doi.org/10.1109/iit.2000.924253
Autor:
J. Weeman, Che-Hoo Ng, S. Mehta, Steven R. Walther, G. Angel, Ukyo Jeong Ukyo Jeong, W. Piscitello
Publikováno v:
1998 International Conference on Ion Implantation Technology. Proceedings (Cat. No.98EX144).
Wafer charge control has evolved from systems that add gas to the beam or extract electrons from an external source to systems that respond directly to beam potential and current density via an externally coupled plasma. The capability of a plasma to
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::cded9e44f872d0564fe71875e905bcb4
https://doi.org/10.1109/iit.1999.812195
https://doi.org/10.1109/iit.1999.812195
Conference
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