Zobrazeno 1 - 7
of 7
pro vyhledávání: '"W. M. Holber"'
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 15:1409-1412
Photoresist removal was studied using single-crystal silicon samples mounted on a ceramic heater in an UHV compatible chamber. The photoresist-coated sample was exposed to an ozone-oxygen mixture at atmospheric pressure and at a flow rate of 4 s l/mi
Publikováno v:
Journal of The Electrochemical Society. 143:288-292
An electron cyclotron resonance (ECR) reactor was used to develop a low damage CF{sub 4}/O{sub 2}/Ar etch process for patterning submicron features in SiN{sub x} films on GaAs substrates. Statistically designed experiments were performed to optimize
Publikováno v:
Review of Scientific Instruments. 63:3862-3868
Interferometric thermometry is a promising noncontact technique for measuring the temperature of transparent substrates (with polished front and back surfaces) from thermally induced changes in sample thickness and refractive index. However, for subs
Autor:
W. M. Holber, J. Forster
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 8:3720-3725
Measurements have been made of ion energies in an electron cyclotron resonance plasma, under conditions typically employed for semiconductor materials processing. Both ion energies along magnetic field lines and ion energy distributions generated by
Publikováno v:
The Journal of Chemical Physics. 73:1212-1221
Experiments show that a beam of electrons tends to trap or guide neutral molecules so their motion is preferentially parallel or antiparallel to that of the electrons. In one apparatus the beam of electrons is coaxial with a molecular beam. When the
Publikováno v:
Review of Scientific Instruments. 49:449-451
An extractor gauge type electron bombardment ion source using carbon fiber bundles as field electron emitters is described. The cold cathode permits operation of the ionizer within a liquid He cooled cryopump. The high pumping speed for all molecules