Zobrazeno 1 - 10
of 16
pro vyhledávání: '"W. L. Gladfelter"'
Publikováno v:
Journal of Materials Science: Materials in Electronics. 9:465-471
RuO2/Ru conducting films were deposited on low stress Si3N4/Si substrates by reactive r.f. sputtering deposition at a substrate temperature of 400°C to introduce a new bottom electrode for microelectromechanical system devices based on a Pb(Zr1-xTix
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1a12d644220bf6e9a3aaf503135f0729
https://doi.org/10.1023/a:1008910326521
https://doi.org/10.1023/a:1008910326521
Autor:
W. L. Gladfelter, Y. Senzaki
Publikováno v:
ChemInform. 25
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ac2f7254636680cf827912a4a81d3705
https://doi.org/10.1002/chin.199438024
https://doi.org/10.1002/chin.199438024
Autor:
J. D. Gargulak, W. L. Gladfelter
Publikováno v:
ChemInform. 25
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d1acfd0baef07ce468335889b88744c2
https://doi.org/10.1002/chin.199436085
https://doi.org/10.1002/chin.199436085
Autor:
Dmitri O. Klenov, Zhihong Zhang, W. L. Gladfelter, Mo Li, Stephen A. Campbell, Susanne Stemmer, Melody P. Agustin
Publikováno v:
Journal of Applied Physics. 98:054506
High-permittivity hafnium titanate (HfxTi1−xO2) films of various compositions have been investigated. Chemical-vapor deposited thin films have well-controlled composition and a smooth surface. Thicker films show large, highly anisotropic grains wit
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b3031c88a3854c970276a86606b30628
https://doi.org/10.1063/1.2039268
https://doi.org/10.1063/1.2039268
Publikováno v:
Chemical Vapor Deposition; Mar2006, Vol. 12 Issue 2/3, p143-150, 8p
Autor:
D. E. FJARE, W. L. GLADFELTER
Publikováno v:
Chemischer Informationsdienst. 13
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b337a9ac72a652f03dd4166806498648
https://doi.org/10.1002/chin.198202283
https://doi.org/10.1002/chin.198202283
Autor:
J. L. ZUFFA, W. L. GLADFELTER
Publikováno v:
Chemischer Informationsdienst. 17
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::92158f1e170d16c52407be14dd7264cc
https://doi.org/10.1002/chin.198648295
https://doi.org/10.1002/chin.198648295
Publikováno v:
Chemischer Informationsdienst. 11
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3fff7c8214c8f4c2dbb8ba180e407002
https://doi.org/10.1002/chin.198048274
https://doi.org/10.1002/chin.198048274
Autor:
G. L. GEOFFROY, W. L. GLADFELTER
Publikováno v:
Chemischer Informationsdienst. 9
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5e28376c87142f9344fd97d9bf495ae5
https://doi.org/10.1002/chin.197808299
https://doi.org/10.1002/chin.197808299