Zobrazeno 1 - 10
of 27
pro vyhledávání: '"W. H. Gries"'
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 12:2467-2472
Centroid depth determinations by angle‐resolved self‐ratio x‐ray fluorescence spectrometry on ion‐implanted depth profiles have been carried out at a synchrotron radiation source using ‘‘white’’ radiation. For ion implants of phosphor
Autor:
W. H. Gries
Publikováno v:
Pure and Applied Chemistry. 64:545-574
Publikováno v:
Review of Scientific Instruments. 63:1194-1197
An apparatus for angle‐resolved, wavelength‐dispersive x‐ray fluorescence spectroscopy with synchrotron radiation has been built and tested at the beam line BN2 of the Bonn electron stretcher and accelerator (ELSA). The apparatus is to be used
Autor:
W. H. Gries
Publikováno v:
Surface and Interface Analysis. 17:803-812
The well-known phenomenon of forward (elastic) scattering pf x-ray photoelectrons and Auger electrons, which gives rise to prominent diffraction peaks for emission from monocrystalline materials, can lead to a much less prominent, yet significant, an
Publikováno v:
Surface and Interface Analysis. 17:693-704
The attenuation of Auger electrons and photoelectrons in solids as described by the so-called depth distribution function (DDF), has been studied by means of a Monte Carlo simulation of electron transport in matter. Elastic scattering plays a signifi
Publikováno v:
Surface and Interface Analysis. 17:719-725
The previously reported1,2 effect of low-energy (several keV) ion bombardment on the surface topography of InP was investigated by scanning transmission electron microscopy. Convergent beam electron diffraction patterns of the surface growth ‘cones
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 9:21-26
The emission angle dependence of the depth distribution function of signal electrons in electron spectroscopies has been studied by means of a Monte Carlo simulation in which elastic scattering plays a significant role. Calculations were made for Si,
Autor:
Wolfgang S. M. Werner, W. H. Gries
Publikováno v:
Surface and Interface Analysis. 16:149-153
Autor:
W. Koschig, W. H. Gries
Publikováno v:
Surface and Interface Analysis. 16:321-324
Publikováno v:
Fresenius' Journal of Analytical Chemistry. 349:144-145
Measurements on the centroid depth of ion-implanted phosphorus-in-silicon specimen by the method of angle-resolved, self-ratio X-ray fluorescence spectrometry (AR/SR/XFS) have been carried out using ‘white’ synchrotron radiation (SR). The measure