Zobrazeno 1 - 10
of 11
pro vyhledávání: '"W. D. Hinsberg"'
Autor:
S. Meyers, W. D. Hinsberg
Publikováno v:
SPIE Proceedings.
A numeric model is proposed describing the chemical and physical mechanisms governing image formation in metaloxide (MOx) EUV photoresist systems. Experimental measurements of physical and chemical properties are used to develop a quantitative repres
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5b4658327b2ee7a34af8884babc112b6
https://doi.org/10.1117/12.2260265
https://doi.org/10.1117/12.2260265
Autor:
W. D. Hinsberg, F. A. Houle
Publikováno v:
The Journal of Physical Chemistry. 99:14477-14485
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::63324b49115f9098d539366dc4d45af7
https://doi.org/10.1021/j100039a040
https://doi.org/10.1021/j100039a040
Publikováno v:
IEEE Transactions on Electron Devices. 37:1828-1835
The line edge profile simulation of a tone-switching resist system, obtained from the dissolution model of dual-sensitized, novolak-based resist in aqueous developer, is described. The model incorporates the actinic response of both a positive and a
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0ea4242bb2fbd93841897ff34bc60c9c
https://doi.org/10.1109/16.57133
https://doi.org/10.1109/16.57133
Publikováno v:
Encyclopedia of Polymer Science and Technology.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::8417a27d7df99c273328805cdee15020
https://doi.org/10.1002/0471440264.pst183
https://doi.org/10.1002/0471440264.pst183
Publikováno v:
ACS Symposium Series ISBN: 9780841227217
Polymers for Microelectronics: Resists and Dielectrics
Polymers for Microelectronics: Resists and Dielectrics
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::46939b2fb0d6cfc19947e494bd715d50
https://doi.org/10.1021/bk-1994-0537.ch007
https://doi.org/10.1021/bk-1994-0537.ch007
Publikováno v:
ACS Symposium Series ISBN: 9780841227217
Polymers for Microelectronics: Resists and Dielectrics
Polymers for Microelectronics: Resists and Dielectrics
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f9e01e46a7deae38435fed5aa9f18ece
https://doi.org/10.1021/bk-1994-0537.ch011
https://doi.org/10.1021/bk-1994-0537.ch011
Publikováno v:
IBM Systems Journal. 25:399-416
Printer and display technologies have undergone remarkable changes since the beginning of the computer era. In this paper we trace the evolution of these two types of I/O devices, from the middle of the 1940s to the present, and show how computer sys
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::934e7f13902e27faf2a851f997026c7d
https://doi.org/10.1147/sj.253.0399
https://doi.org/10.1147/sj.253.0399
Publikováno v:
Clinical chemistry. 31(1)
A long-lived fluorescence label (Tb3+) has been attached to the antigen of interest by using a bifunctional chelating agent 1-(p-benzenediazonium)-EDTA. A nonequilibrium competitive-binding immunoassay protocol, in conjunction with time-resolved dete
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=pmid________::4bb329c636502748be95b516ff31189b
https://pubmed.ncbi.nlm.nih.gov/3917382
https://pubmed.ncbi.nlm.nih.gov/3917382
Autor:
LARRY F. THOMPSON, C. GRANT WILLSON, SEIICHI TAGAWA, E. Reichmanis, F. M. Houlihan, O. Nalamasu, T. X. Neenan, E. Chin, J. M. Kometani, Ying Jiang, David R. Bassett, N. Takeyama, Y. Ueda, T. Kusumoto, H. Ueki, M. Hanabata, H. Ito, Y. Maekawa, R. Sooriyakumaran, E. A. Mash, Eiichi Kobayashi, Makoto Murata, Mikio Yamachika, Yasutaka Kobayashi, Yoshiji Yumoto, Takao Miura, W. D. Hinsberg, S. A. MacDonald, C. D. Snyder, R. D. Allen, C.-P. Lei, T. Long, S. K. Obendorf, F. Rodriguez, Kwang-Duk Ahn, Deok-Il Koo, Yoshiaki Inaki, Nobuo Matsumura, Kiichi Takemoto, G. M. Wallraff, L. L. Simpson, R. R. Kunz, Masamitsu Shirai, Masahiro Tsunooka, K. Watanabe, E. Yano, T. Namiki, Y. Yoneda, J. M. Calvert, W. J. Dressick, C. S. Dulcey, M. S. Chen, J. H. Georger, D. A. Stenger, T. S. Koloski, G. S. Calabrese, V. Rao, C. W. Frank, R. F. W. Pease, James R. Sheats, Ralph Dammel, Michael T. Pottiger, John C. Coburn, M. F. Welker, H. R. Allcock, G. L. Grune, R. T. Chern, V. T. Stannett, Shinji Ando, Tohru Matsuura, Shigekuni Sasaki, K. Ushida, A. Kira, S. Tagawa, Y. Yoshida, H. Sh