Zobrazeno 1 - 6
of 6
pro vyhledávání: '"W. D. Buckley"'
Publikováno v:
Journal of The Electrochemical Society. 128:1116-1120
A high yield process will be described for fabricating large area free‐standing membranes of thickness down to 0.5 μm for use as an x‐ray lithography mask substrate. The choice of material, method of preparation, and technique for separating the
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::22e30aca6df1dc1791fbd440ba82916c
https://doi.org/10.1149/1.2127562
https://doi.org/10.1149/1.2127562
Publikováno v:
Journal of Vacuum Science and Technology. 11:675-679
We report a preliminary survey of the effects of dc substrate bias and residual gas contamination on the average composition, internal stress, electrical conductivity, and crystal structure of molybdenum films deposited by rf sputtering. We find stro
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6f37bb2bd7a276d5acebe6c3874220f8
https://doi.org/10.1116/1.1312734
https://doi.org/10.1116/1.1312734
Autor:
W. D. Buckley
Publikováno v:
Applied Physics Letters. 29:743-746
A simple relaxation analysis is presented to show that the transient on characteristics of the amorphous semiconductor device are consistent with bulk filament characteristics.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::dbe86762f361d2b4816a217cff18872f
https://doi.org/10.1063/1.88925
https://doi.org/10.1063/1.88925
Autor:
G. P. Hughes, W. D. Buckley
Publikováno v:
Journal of The Electrochemical Society. 128:1106-1111
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7e8c7616cf7a01001bfd3b15e6a1b433
https://doi.org/10.1149/1.2127560
https://doi.org/10.1149/1.2127560
Publikováno v:
Journal of The Electrochemical Society. 128:1111-1116
The design, operation, and performance of an experimental alignment system which is suitable for use with an x‐ray lithography exposure system will be described. The system consists of optical, mechanical, and electronic subsystems and permits alig
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::52891777fc9ebb79f4fc35849ee7cf55
https://doi.org/10.1149/1.2127561
https://doi.org/10.1149/1.2127561
Autor:
W. D. Buckley, Walter Hayduk
Publikováno v:
The Canadian Journal of Chemical Engineering. 49:667-671
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5ef72fd860bacf3afe4dd29ca7df9258
https://doi.org/10.1002/cjce.5450490520
https://doi.org/10.1002/cjce.5450490520