Zobrazeno 1 - 10
of 64
pro vyhledávání: '"W. Cote"'
Autor:
Vincent L. Biron, Ashlee Matkin, Morris Kostiuk, Jordana Williams, David W. Cote, Jeffrey Harris, Hadi Seikaly, Daniel A. O’Connell
Publikováno v:
Journal of Otolaryngology - Head and Neck Surgery, Vol 47, Iss 1, Pp 1-9 (2018)
Abstract Background Recent guidelines for the management of thyroid nodules incorporate mutation testing as an adjunct for surgical decision-making, however current tests are costly with limited accuracy. Droplet digital PCR (ddPCR) is an ultrasensit
Externí odkaz:
https://doaj.org/article/b8173b4b6e0a4cae9f25a89bfe581b4a
Publikováno v:
Public health. 176
Objectives Canada's Indian Residential School (IRS) system aimed to annihilate Indigenous culture among Indigenous children. Negative health impacts have been documented not only among survivors but also among their descendants. Reconnection with cul
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::a00f4e7624c11994c39711ed029a1a44
https://pubmed.ncbi.nlm.nih.gov/30691945
https://pubmed.ncbi.nlm.nih.gov/30691945
Publikováno v:
Journal of Entomological Science. 39:267-274
Acaricides are often used to suppress populations of the twospotted spider mite, Tetranychus urticae Koch. Problems associated with acaricide use have led some ornamental producers to incorporate releases of the predaceous mite Phytoseiulus persimili
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4bd0f2ac468591eb77c240c8f05984d9
https://doi.org/10.18474/0749-8004-39.2.267
https://doi.org/10.18474/0749-8004-39.2.267
Publikováno v:
HortScience. 37:906-909
The twospotted spider mite, Tetranychus urticae Koch, is a serious pest of many nursery crops. Regular acaricide applications are required to maintain acceptable population levels of this pest. Phytoseiulus persimilis Athias-Henriot is a commercially
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::632715ae002f9d8a62985b5ea54e7557
https://doi.org/10.21273/hortsci.37.6.906
https://doi.org/10.21273/hortsci.37.6.906
Autor:
Laverne D. Gugino, W. Eric L. Grimson, Martha E. Shenton, Geoffrey F. Potts, Rafael Romero, Andres Gonzalez, W. Cote, Gil J. Ettinger, Peter McL. Black, Linda S. Aglio, Michael E. Leventon, Eben Alexander, Ron Kikinis
Publikováno v:
Techniques in Neurosurgery. 7:33-51
A practical means of noninvasively stimulating the cortex was developed in the mid-1980s. Both electrical and magnetic stimulating pulses applied transcranially were shown to be capable of exciting motor cortex. Transcranial magnetic stimulation (TCM
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::57e8db13e854e2501c7b68e31cc2fe6a
https://doi.org/10.1097/00127927-200103000-00006
https://doi.org/10.1097/00127927-200103000-00006
Autor:
Eduard A. Cartier, X. Chen, Pierre Malinge, L. Kang, T. Watanabe, Michael P. Belyansky, L. Economikos, O. Menut, Vijay Narayanan, C. Reddy, R. Divakaruni, Y.H. Park, Ravi Prakash Srivastava, M. Pallachalil, R. Koshy, Dominic J. Schepis, P. Montanini, Keith Kwong Hon Wong, M. Eller, Park Sejun, A. Ogino, H. Mallela, U. Kwon, T. Shimizu, W. Cote, Jay W. Strane, Srikanth Samavedam, M. Chae, Anurag Mittal, R. Sampson, J. Meiring, R. Joy, Huiling Shang, S. Soss, X. Yang, Keith H. Tabakman, M. Oh, W. Lai, C. Tran, S. Jain, E. Josse, D. Codi, H.V. Meer, B.Y. Kim, Jung-Geun Kim, Jin Bum Kim, C. Goldberg, Henry K. Utomo, J. Ciavatti, Barry Linder, R. Vega, W. Neumueller, J. Muncy, Kyung-hwan Cho, Scott J. Bukofsky, Alvin G. Thomas, Dinesh Koli, Katherina Babich, Bomi Kim, S. Lian, E. Alptekin, Y. Liu, S. H. Rhee, X. Wu, R. Arndt, W.L. Tan, Frederic Lalanne, Nam-Sung Kim, Ravikumar Ramachandran, K.Y. Lee, M.H. Nam, Randy W. Mann, Il-Ryong Kim, Yujun Li, V. Sardesai, Siddarth A. Krishnan, C. Tian, D. Levedakis, Seung-Kwon Kim, Jedon Kim, M. Celik, F. Matsuoka, M. Weybright, J. Sudijono, M. Aminpur, B. Hamieh, Greg Northrop, J.W. Lee
Publikováno v:
2012 Symposium on VLSI Technology (VLSIT).
In this paper, we present a high performance planar 20nm CMOS bulk technology for low power mobile (LPM) computing applications featuring an advanced high-k metal gate (HKMG) process, strain engineering, 64nm metal pitch & ULK dielectrics. Compared w
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0ec874734f9fcf487e547466890b1297
https://doi.org/10.1109/vlsit.2012.6242495
https://doi.org/10.1109/vlsit.2012.6242495
Autor:
Jason K M, Chau, Peter, Dzigielewski, Alex, Mlynarek, David W, Cote, Heather, Allen, Jeffery R, Harris, Hadi R, Seikaly
Publikováno v:
Journal of otolaryngology - headneck surgery = Le Journal d'oto-rhino-laryngologie et de chirurgie cervico-faciale. 38(4)
To determine which method of skin incision has superior cosmetic and patient satisfaction outcomes.Consenting patients undergoing bilateral neck dissection who met the inclusion criteria were prospectively enrolled. Each side of the neck was randomly
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=pmid________::35db619b334ccdd5810c187d63822770
https://pubmed.ncbi.nlm.nih.gov/19755082
https://pubmed.ncbi.nlm.nih.gov/19755082
Autor:
A. Gasasira, Louis V. Medina, W. Cote, A. Henning, T. Merbeth, M. Craig, Ernesto Shiling, M. Karthikeyan, W. Ferrante
Publikováno v:
2008 IEEE International Conference on Microelectronic Test Structures.
A comprehensive 45 nm short-flow test chip was designed and is currently used to improve defect-limited yield. In a novel development to reduce test time, the DC test structures are tested in parallel mode on a functional test platform, resulting in
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f036d5903ca38cd70a4201e68a10c39f
https://doi.org/10.1109/icmts.2008.4509314
https://doi.org/10.1109/icmts.2008.4509314
Autor:
E. Wolf, S. Agarwal, W. Cote, M. Karthikeyan, M. Hall, B. Mitchell, J. Garcia, Greg Yeric, S. Fox
Publikováno v:
2006 IEEE International Conference on Microelectronic Test Structures.
This paper describes a yield learning infrastructure that has been developed and deployed to help rapidly ramp 65-nm random and systematic yield. This infrastructure consists of a 4-Mb addressable-array test circuit with >8000 unique test structures
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::c250b0bb17e90e3468149022e4b7a97f
https://doi.org/10.1109/icmts.2006.1614284
https://doi.org/10.1109/icmts.2006.1614284
Autor:
W.-K. Li, Chester T. Dziobkowski, Stephan A. Cohen, Michael Lane, K. Ida, C.-C. Yang, Jeremy L. Martin, S. Vogt, T. Van Kleeck, Jason Gill, David L. Questad, Philip L. Flaitz, William F. Landers, X.-H. Liu, Christopher D. Muzzy, T. Ivers, T. Shaw, Kaushik Chanda, J. Wright, M. Cullinan, Takeshi Nogami, A. Sakamoto, Son Nguyen, Larry Clevenger, W. Cote, M. Yoon, A. Cowley, S. Tempest, Charles R. Davis, Daniel C. Edelstein, David P. Klaus, James J. Demarest, Andrew H. Simon, Swastika N. Das, Anita Madan, C. Parks, Stephen M. Gates, W. Wille, Darryl D. Restaino, John A. Fitzsimmons, S. Molis, Du Binh Nguyen, R. G. Filippi, Birendra N. Agarwala, D. Hawken, S. Arai, M. Ono, N. Klymko, Y.-H. Lin, A. Carbone, Joe Lee, Hazara S. Rathore, Derren N. Dunn, Alfred Grill, Eric G. Liniger, S. Lane, Y. Shimooka, Yanfeng Wang, Sandra G. Malhotra, Timothy J. Dalton, P. Davis, E. Simonyi
Publikováno v:
Proceedings of the IEEE 2004 International Interconnect Technology Conference (IEEE Cat. No.04TH8729).
We report a comprehensive characterization of a 90 nm CMOS technology with Cu/SiCOH low-k interconnect BEOL. Significant material and integration engineering have led to the highest reliability, without degrading the performance expected from low-k.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7517d96a0646167b24ad2d088b95274a
https://doi.org/10.1109/iitc.2004.1345750
https://doi.org/10.1109/iitc.2004.1345750