Zobrazeno 1 - 10
of 48
pro vyhledávání: '"W D Reents"'
Autor:
K. Demirkan, B. Wright, M. Reid, Eric Dalton, C. Xu, K. Hannigan, Jeff Punch, J. P. Franey, Maurice N. Collins, D. A. Fleming, W. D. Reents, Robert L. Opila
Publikováno v:
Journal of Electronic Materials. 41:611-623
Recently, the corrosion resistance of printed wiring board (PWB) finishes has generated considerable interest due to field failures observed in various parts of the world. This study investigates the corrosion issues associated with the different lea
Publikováno v:
IEEE Transactions on Components and Packaging Technologies. 30:666-672
Precision thick chip resistors are used in a variety of different industries, from telecommunications to automotive electronics, and as such can be exposed to mild and aggressive corrosive environments. This paper investigates the corrosion performan
Autor:
S. W. Downey, D. J. Siconolfi, A. M. Mujsce, J. D. Sinclair, A. G. Swanson, A. B. Emerson, W. D. Reents, A. J. Muller
Publikováno v:
Aerosol Science and Technology. 23:263-270
We have built a particle analyzer capable of real-time detection and characterization of individual particles. Particle analysis is accomplished by pulsed laser ablation of a particle followed by time-of-flight mass spectrometry of the resulting atom
Autor:
W D Reents, M L Mandich
Publikováno v:
Plasma Sources Science and Technology. 3:373-380
Potential particle-forming reactions of hydrogenated silicon cations with silane and disilane, in the presence and absence of water, are summarized. The reactions are studied in the ion trap of a Fourier transform mass spectrometer at 10-7-10-5 Torr.
Autor:
A. G. Swanson, J. D. Sinclair, S. W. Downey, D. J. Siconolfi, A. M. Mujsce, A. B. Emerson, W. D. Reents, A. J. Muller
Publikováno v:
Plasma Sources Science and Technology. 3:369-372
A particle analyser is described that simultaneously detects and characterizes 10 mu m diameter particles independent of particle composition in real time. No previous instrument has been able to perform these functions simultaneously. Our design use
Publikováno v:
International Journal of Mass Spectrometry and Ion Processes. 130:133-142
Chemistry of indium phosphide clusters is studied using the powerful trapped ion cell techniques of Fourier transform ion cyclotron resonance (FTICR) mass spectrometry in conjunction with an external cluster source and ion guide. The external source
Publikováno v:
The Journal of Chemical Physics. 97:7226-7233
Sequential reactions of SiD0–3+ and Si2D0–6+ with 10−7–10−6 Torr of disilane are described. The reactions proceed, with few exceptions, by addition of SiD2 with simultaneous loss of SiD4. The growing cluster cations decrease in reactivity w
Autor:
M. L. Mandich, W. D. Reents
Publikováno v:
The Journal of Chemical Physics. 96:4429-4439
The thermal (300 K) reaction of SiD+2 with SiD4 proceeds at greater than the Langevin collision rate (21±3×10−10 cm3/molecule s ). The reaction products SiD+3, Si2D+2, and Si2D+4 are produced in a 54:7:39 ratio. Both silicon isotope exchange and
Autor:
M. L. Mandich, W. D. Reents
Publikováno v:
The Journal of Chemical Physics. 96:4233-4245
Growth of large cationic clusters is observed in real time for subsilane and subdisilane cations in the presence of silane/disilane–water mixtures. SiD+0–3 and Si2D+0–6 are created by electron impact in the trapped ion cell of a Fourier transfo
Autor:
W. D. Reents, M. L. Mandich
Publikováno v:
The Journal of Chemical Physics. 95:7360-7372
Sequential clustering reactions of SiD+ with SiD4 are monitored in the trapped ion cell of a Fourier transform mass spectrometer. At thermal energies, SiD+ initially clusters by rapid addition of silylene accompanied by elimination of D2. This growth